La-doped Copper Nitride Films Prepared by Reactive Magnetron Sputtering
文献类型：期刊论文
| 作者 | X. A. Li ; J. P. Yang ; A. Y. Zuo ; Z. B. Yuan ; Z. L. Liu ; K. L. Yao |
| 刊名 | Journal of Materials Science & Technology
 |
| 出版日期 | 2009 |
| 卷号 | 25期号:2页码:233-236 |
| 关键词 | Copper nitride film La-doped copper nitride films Magnetron sputtering Crystal structure cu3n thin-films photoluminescence growth |
| ISSN号 | 1005-0302 |
| 中文摘要 | Copper nitride film (Cu(3)N) and La-doped copper nitride films (La(x)Cu(3)N) were prepared on glass substrates by reactive magnetron sputtering of a pure Cu and a pure La targets under N(2) atmosphere. The results show that La-free film was composed Of Cu(3)A crystallites with anti-ReO(3) structure with (111) texture. The formation of the La(x)Cu(3)N films is affected strongly by La, and the peak intensity of the preferred crystalline [111]-orientation decreases with increasing the concentration of La. High concentration of La may prevent the formation of the Cu(3)N from crystallization. Compared with the Cu(3)N films, the resistivity of the La(x)Cu(3)N films have been decreased. |
| 原文出处 | |
| 公开日期 | 2012-04-13 |
| 源URL | [http://210.72.142.130/handle/321006/32039]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | X. A. Li,J. P. Yang,A. Y. Zuo,et al. La-doped Copper Nitride Films Prepared by Reactive Magnetron Sputtering[J]. Journal of Materials Science & Technology,2009,25(2):233-236. |
| APA | X. A. Li,J. P. Yang,A. Y. Zuo,Z. B. Yuan,Z. L. Liu,&K. L. Yao.(2009).La-doped Copper Nitride Films Prepared by Reactive Magnetron Sputtering.Journal of Materials Science & Technology,25(2),233-236. |
| MLA | X. A. Li,et al."La-doped Copper Nitride Films Prepared by Reactive Magnetron Sputtering".Journal of Materials Science & Technology 25.2(2009):233-236. |
入库方式： OAI收割
来源：金属研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。