Microstructural control of Cr-Si-N films by a hybrid arc ion plating and magnetron sputtering process
文献类型：期刊论文
| 作者 | Q. M. Wang ; K. H. Kim |
| 刊名 | Acta Materialia
 |
| 出版日期 | 2009 |
| 卷号 | 57期号:17页码:4974-4987 |
| 关键词 | Cr-Si-N Nanocomposite Physical vapor deposition Nanocrystalline microstructure Transmission electron microscopy nanocomposite thin-films negative bias voltage mechanical-properties coating system cathodic arc deposition silicon growth layer hard |
| ISSN号 | 1359-6454 |
| 中文摘要 | The microstructural evolution of Cr-Si-N films deposited by a hybrid arc ion plating and magnetron sputtering process was investigated by varying the sputtering power of Si target and substrate bias voltage. Detailed nanocomposite microstructures of the films were studied by high-resolution transmission electron microscopy. The results indicated that the incorporation of Si into the growing CrN films at 0 V led to the formation of a nanocomposite containing CrN nanocolumns embedded in amorphous SiN(x) matrix or near-amorphous microstructure. For the films having a Si content of similar to 10 at.% and similar to 15 at.%, a negative bias voltage of -50 V resulted in the aggregation of nanocolumns in the amorphous matrix. Further increase of negative bias voltage to -250 V led to the formation of a three-dimensional CrN/a-SiN(x) nanocomposite microstructure. The mechanism of microstructure evolution is discussed by considering the thermodynamic and kinetic factors. (C) 2009 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved. |
| 原文出处 | |
| 公开日期 | 2012-04-13 |
| 源URL | [http://210.72.142.130/handle/321006/32371]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | Q. M. Wang,K. H. Kim. Microstructural control of Cr-Si-N films by a hybrid arc ion plating and magnetron sputtering process[J]. Acta Materialia,2009,57(17):4974-4987. |
| APA | Q. M. Wang,&K. H. Kim.(2009).Microstructural control of Cr-Si-N films by a hybrid arc ion plating and magnetron sputtering process.Acta Materialia,57(17),4974-4987. |
| MLA | Q. M. Wang,et al."Microstructural control of Cr-Si-N films by a hybrid arc ion plating and magnetron sputtering process".Acta Materialia 57.17(2009):4974-4987. |
入库方式： OAI收割
来源：金属研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。