Electrochemical behaviour of microcrystalline aluminium in neutral fluoride containing solutions
文献类型:期刊论文
作者 | B. Zhang ; Y. Li ; F. H. Wang |
刊名 | Corrosion Science
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出版日期 | 2009 |
卷号 | 51期号:2页码:268-275 |
关键词 | Aluminium Sputtered films Passive films pitting corrosion crevice corrosion pit initiation noise-analysis pure aluminum chloride sulfate alloy ions susceptibility |
ISSN号 | 0010-938X |
中文摘要 | The electrochemical behaviour of microcrystalline pure aluminium coating (mc-Al), fabricated by a magnetron sputtering technique, has been investigated in NaF as well as NaF + NaCl aqueous solutions. Results indicate that the anodic polarization characteristic changes with NaF concentration. F(-) anions promote the formation of a passive film, whose semiconducting properties were investigated. When the F(-) concentration is high ([F(-)] >= 0.03 mol/L) the passive film is mainly composed of aluminium fluoride, which is an n-type semiconductor on mc-Al and a p-type semiconductor on polycrystalline Al (pc-Al). In NaF + NaCl aqueous solutions, Cl(-) and F(-) ions compete in affecting the type of semiconducting passive films formed on mc-Al. (C) 2008 Elsevier Ltd. All rights reserved. |
原文出处 | |
公开日期 | 2012-04-13 |
源URL | [http://210.72.142.130/handle/321006/32523] ![]() |
专题 | 金属研究所_中国科学院金属研究所 |
推荐引用方式 GB/T 7714 | B. Zhang,Y. Li,F. H. Wang. Electrochemical behaviour of microcrystalline aluminium in neutral fluoride containing solutions[J]. Corrosion Science,2009,51(2):268-275. |
APA | B. Zhang,Y. Li,&F. H. Wang.(2009).Electrochemical behaviour of microcrystalline aluminium in neutral fluoride containing solutions.Corrosion Science,51(2),268-275. |
MLA | B. Zhang,et al."Electrochemical behaviour of microcrystalline aluminium in neutral fluoride containing solutions".Corrosion Science 51.2(2009):268-275. |
入库方式: OAI收割
来源:金属研究所
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