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Yttrium-doped TiO(2) films prepared by means of DC reactive magnetron sputtering

文献类型:期刊论文

作者W. J. Zhang ; K. L. Wang ; S. L. Zhu ; Y. Li ; F. H. Wang ; H. B. He
刊名Chemical Engineering Journal
出版日期2009
卷号155期号:1-2页码:83-87
关键词TiO(2) film Reactive magnetron sputtering Yttrium doping Photocatalytic activity Degradation photocatalytic degradation nanoparticles spectroscopy oxidation titania surface
ISSN号1385-8947
中文摘要Y(2)O(3)-doped TiO(2) films were prepared on glass substrates by means of pulsed DC reactive magnetron sputtering method using titanium and yttrium mixed target. XPS results showed that the films were composed of fully oxidation states of the two elements, Y(2)O(3)-TiO(2) composite oxides. The existence of yttrium inhibited the crystal growth of TiO(2) in the films and Y(2)O(3) mainly presented in its amorphous state in the films. UV-vis transmittance of the films decreased whereas their reflectance increased slightly. Yttrium doping had detrimental effect on photocatalytic activity of the TiO(2) films. Photocatalytic degradation efficiency of methyl orange solution declined along with increasing yttrium concentration. (C) 2009 Elsevier B.V. All rights reserved.
原文出处://WOS:000274769500010
公开日期2012-04-13
源URL[http://210.72.142.130/handle/321006/32571]  
专题金属研究所_中国科学院金属研究所
推荐引用方式
GB/T 7714
W. J. Zhang,K. L. Wang,S. L. Zhu,et al. Yttrium-doped TiO(2) films prepared by means of DC reactive magnetron sputtering[J]. Chemical Engineering Journal,2009,155(1-2):83-87.
APA W. J. Zhang,K. L. Wang,S. L. Zhu,Y. Li,F. H. Wang,&H. B. He.(2009).Yttrium-doped TiO(2) films prepared by means of DC reactive magnetron sputtering.Chemical Engineering Journal,155(1-2),83-87.
MLA W. J. Zhang,et al."Yttrium-doped TiO(2) films prepared by means of DC reactive magnetron sputtering".Chemical Engineering Journal 155.1-2(2009):83-87.

入库方式: OAI收割

来源:金属研究所

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