Effect of Sample Configuration on Droplet-Particles of TiN Films Deposited by Pulse Biased Arc Ion Plating
文献类型：期刊论文
| 作者 | Y. H. Zhao ; G. Q. Liu ; J. Q. Xiao ; C. Dong ; L. S. Wen |
| 刊名 | Journal of Materials Science & Technology
 |
| 出版日期 | 2009 |
| 卷号 | 25期号:5页码:681-686 |
| ISSN号 | 1005-0302 |
| 关键词 | Arc ion plating Pulsed bias TiN film Droplet-particles plasma sheath vacuum-arc macroparticles levitation substrate mechanism voltage dust |
| 中文摘要 | Orthogonal experiments are used to design the pulsed bias related parameters, including bias magnitude, duty cycle and pulse frequency, during arc ion deposition of TiN films on stainless steel substrates in the case of samples placing normal to the plasma flux. The effect of these parameters on the amount and the size distribution of droplet-particles are investigated, and the results have provided sufficient evidence for the physical model, in which particles reduction is due to the case that the particles are negatively charged and repulsed from negative pulse electric field. The effect of sample configuration on amount and size distribution of the particles are analyzed The results of the amount and size distribution of the particles are compared to those in the case of samples placing parallel to the plasma flux. |
| 原文出处 | |
| 公开日期 | 2012-04-13 |
| 源URL | [http://210.72.142.130/handle/321006/32604]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | Y. H. Zhao,G. Q. Liu,J. Q. Xiao,et al. Effect of Sample Configuration on Droplet-Particles of TiN Films Deposited by Pulse Biased Arc Ion Plating[J]. Journal of Materials Science & Technology,2009,25(5):681-686. |
| APA | Y. H. Zhao,G. Q. Liu,J. Q. Xiao,C. Dong,&L. S. Wen.(2009).Effect of Sample Configuration on Droplet-Particles of TiN Films Deposited by Pulse Biased Arc Ion Plating.Journal of Materials Science & Technology,25(5),681-686. |
| MLA | Y. H. Zhao,et al."Effect of Sample Configuration on Droplet-Particles of TiN Films Deposited by Pulse Biased Arc Ion Plating".Journal of Materials Science & Technology 25.5(2009):681-686. |
入库方式： OAI收割
来源：金属研究所
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