Effects of power density and post annealing process on the microstructure and wettability of TiO2 films deposited by mid-frequency-magnetron reactive sputtering
文献类型：期刊论文
| 作者 | Y. Cui ; H. Du ; J. Q. Xiao ; L. Wen |
| 刊名 | Journal of Materials Science & Technology
 |
| 出版日期 | 2008 |
| 卷号 | 24期号:2页码:172-178 |
| 关键词 | titanium dioxide reactive magnetron sputtering phase composition microstructure hydrophilicity thin-films titanium-dioxide photoinduced hydrophilicity surfaces anatase conversion photocatalysis enhancement electrode stress |
| ISSN号 | 1005-0302 |
| 中文摘要 | The relationship of "preparation parameters-microstructures-wettability" of TiO2 films was reported. In this work, TiO2 films were deposited onto glass and silicon substrates by using mid-frequency dual magnetron sputtering technique at ambient temperature with various power densities and deposition time. After deposition, the films were heat treated at different annealing temperatures. X-ray diffraction (XRD), Raman spectroscopy, and field-emission scanning electron microscopy (FE-SEM) were utilized to characterize TiO2 films. The wettability of the films was evaluated by water contact angle measurement. The phase transition temperature of TiO2 films depended on the power density. It was demonstrated that wettability was strongly structure dependent and the film with the thickness of 610 nm (the power density was 2.22 W/cm(2)) showed the lowest contact angle (8). It can be concluded that smaller crystallite size, the rutile phase with (110) face being parallel to the surface, and tensile stress favored the hydrophilicity of the TiO2 films. |
| 原文出处 | |
| 公开日期 | 2012-04-13 |
| 源URL | [http://210.72.142.130/handle/321006/32705]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | Y. Cui,H. Du,J. Q. Xiao,et al. Effects of power density and post annealing process on the microstructure and wettability of TiO2 films deposited by mid-frequency-magnetron reactive sputtering[J]. Journal of Materials Science & Technology,2008,24(2):172-178. |
| APA | Y. Cui,H. Du,J. Q. Xiao,&L. Wen.(2008).Effects of power density and post annealing process on the microstructure and wettability of TiO2 films deposited by mid-frequency-magnetron reactive sputtering.Journal of Materials Science & Technology,24(2),172-178. |
| MLA | Y. Cui,et al."Effects of power density and post annealing process on the microstructure and wettability of TiO2 films deposited by mid-frequency-magnetron reactive sputtering".Journal of Materials Science & Technology 24.2(2008):172-178. |
入库方式： OAI收割
来源：金属研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。