Influence of N-2 gas pressure and negative bias voltage on the microstructure and properties of Cr-Si-N films by a hybrid coating system
文献类型：期刊论文
| 作者 | Q. M. Wang ; I. W. Park ; K. Kim |
| 刊名 | Journal of Vacuum Science & Technology A
 |
| 出版日期 | 2008 |
| 卷号 | 26期号:5页码:1188-1194 |
| 关键词 | cathodic arc plasma mechanical-properties sputtering techniques substrate bias nanocomposite films ion-bombardment thin-films deposition temperature hardness |
| ISSN号 | 0734-2101 |
| 中文摘要 | Cr-Si-N films were deposited using a hybrid coating system combining arc ion plating and magnetron sputtering. The authors investigated the influence of N-2 flux rate and negative bias voltage on the microstructure and properties of Cr-Si-N films, e. g., chemical composition, film morphology, phase structure, residual stress, and microhardness. The results showed that all the Cr-Si-N films were close to stoichiometry. The N-2 flux rate had no important influence on the microstructure and properties of the Cr-Si-N films. Applying a negative bias voltage resulted in significant decrease in macroparticle densities and smoother film surface. Also the film microstructure transformed from apparent columnar to nanocomposite microstructure. The maximum microhardness obtained ranged from 45 to 50 GPa at a bias voltage ranging from -50 to -100 V. The microhardness enhancement could be ascribed to the mixed effect of grain size diminishment and residual compressive stress. (c) 2008 American Vacuum Society. |
| 原文出处 | |
| 公开日期 | 2012-04-13 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/33146]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | Q. M. Wang,I. W. Park,K. Kim. Influence of N-2 gas pressure and negative bias voltage on the microstructure and properties of Cr-Si-N films by a hybrid coating system[J]. Journal of Vacuum Science & Technology A,2008,26(5):1188-1194. |
| APA | Q. M. Wang,I. W. Park,&K. Kim.(2008).Influence of N-2 gas pressure and negative bias voltage on the microstructure and properties of Cr-Si-N films by a hybrid coating system.Journal of Vacuum Science & Technology A,26(5),1188-1194. |
| MLA | Q. M. Wang,et al."Influence of N-2 gas pressure and negative bias voltage on the microstructure and properties of Cr-Si-N films by a hybrid coating system".Journal of Vacuum Science & Technology A 26.5(2008):1188-1194. |
入库方式： OAI收割
来源：金属研究所
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