Factors Affecting Microhardness of Ti/TiN Multilayer Films Deposited by Pulsed Bias Arc Ion Plating
文献类型：期刊论文
| 作者 | G. Q. Lin ; Y. H. Zhao ; C. A. Dong ; L. S. Wen |
| 刊名 | Plasma Processes and Polymers
 |
| 出版日期 | 2007 |
| 卷号 | 4页码:S120-S123 |
| 关键词 | arc ion plating films hardness microhardness pulsed bias Ti/TiN multilayer |
| ISSN号 | 1612-8850 |
| 中文摘要 | Ti/TiN multilayer films were deposited on high-speed-steel (HSS) substrates using pulsed-bias arc ion plating. Orthogonal experiments were used to analyze factors affecting microhardness of the films. The results show that of all the pulsed bias related parameters including pulsed bias magnitude, duty ratio, frequency, and film geometry parameters including modulation period, TiN/Ti thickness ratio, and grain size of TiN, the pulsed bias magnitude is the major factor affecting the microhardness. The maximum microhardness of 34.1 GPa was obtained with pulsed bias magnitude 900 V, duty ratio 50%, frequency 30 kHz, and modulation period 84 nm. |
| 原文出处 | |
| 公开日期 | 2012-04-13 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/33677]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | G. Q. Lin,Y. H. Zhao,C. A. Dong,et al. Factors Affecting Microhardness of Ti/TiN Multilayer Films Deposited by Pulsed Bias Arc Ion Plating[J]. Plasma Processes and Polymers,2007,4:S120-S123. |
| APA | G. Q. Lin,Y. H. Zhao,C. A. Dong,&L. S. Wen.(2007).Factors Affecting Microhardness of Ti/TiN Multilayer Films Deposited by Pulsed Bias Arc Ion Plating.Plasma Processes and Polymers,4,S120-S123. |
| MLA | G. Q. Lin,et al."Factors Affecting Microhardness of Ti/TiN Multilayer Films Deposited by Pulsed Bias Arc Ion Plating".Plasma Processes and Polymers 4(2007):S120-S123. |
入库方式： OAI收割
来源：金属研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。