High temperature scaling of Ni-xSi-10 at.% A1 alloys in 1 atm of pure O-2
文献类型：期刊论文
| 作者 | Y. Wu ; Y. Niu |
| 刊名 | Corrosion Science
 |
| 出版日期 | 2007 |
| 卷号 | 49期号:3页码:1656-1672 |
| 关键词 | ternary Ni-xSi-10Al alloys oxidation silicon effect al-si alloys 2-phase binary-alloys internal oxidation ni-al external scale ternary alloys oxidant pressures aluminum alloys degrees c 1 atm |
| ISSN号 | 0010-938X |
| 中文摘要 | The oxidation of Ni-xSi-10Al alloys (with x = 0, 2, 4 and 6 at.%), has been studied at 900 and 1000 C in 1 atm of pure O-2 to examine the effect of different silicon additions on the behavior of ternary Ni-Si-10Al alloys. The kinetic curves of Ni-10Al are approximately parabolic at both 900 and 1000 degrees C. Conversely, the kinetics of the ternary alloys at both temperatures correspond generally to a rate decrease faster than predicted by the parabolic rate law, except for the oxidation of Ni-6Si-10Al at 1000 degrees C, which exhibits a single nearly-parabolic stage. Oxidation of the binary alloy formed at both temperatures an internal oxidation zone beneath a layer of NiO. Oxidation of Ni-2Si-10Al at both temperatures and of the other two alloys at 900 degrees C formed initially a zone of internal oxidation of Al + Si. However, a layer of alumina forming at the front of internal oxidation after some time blocked the internal oxidation and produced a gradual conversion of the metal matrix of this region into NiO, with a simultaneous decrease of the oxidation rate. Conversely, the oxidation of Ni-4Si-10Al and Ni-6Si-10Al at 1000 degrees C did not produce an internal oxidation, but formed an alumina layer directly on the alloy surface after an initial stage when also Ni was oxidized. Therefore, silicon exerts the third-element effect by reducing the critical Al content needed for the transition from its internal to its external oxidation with respect to the corresponding Ni-Al alloy. This result is interpreted by means of an extension to ternary alloys of Wagner's criterion for the same transition in binary alloys based on the attainment of a critical volume fraction of internal oxide. (c) 2006 Elsevier Ltd. All rights reserved. |
| 原文出处 | |
| 公开日期 | 2012-04-13 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/33930]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | Y. Wu,Y. Niu. High temperature scaling of Ni-xSi-10 at.% A1 alloys in 1 atm of pure O-2[J]. Corrosion Science,2007,49(3):1656-1672. |
| APA | Y. Wu,&Y. Niu.(2007).High temperature scaling of Ni-xSi-10 at.% A1 alloys in 1 atm of pure O-2.Corrosion Science,49(3),1656-1672. |
| MLA | Y. Wu,et al."High temperature scaling of Ni-xSi-10 at.% A1 alloys in 1 atm of pure O-2".Corrosion Science 49.3(2007):1656-1672. |
入库方式： OAI收割
来源：金属研究所
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