Structure and tribology property of carbon nitride films deposited by MW-ECR plasma enhanced unbalanced magnetron sputtering
文献类型：期刊论文
| 作者 | P. Gao ; J. Xu ; Y. Piao ; W. Y. Ding ; X. L. Deng ; C. Dong |
| 刊名 | Plasma Science & Technology
 |
| 出版日期 | 2006 |
| 卷号 | 8期号:4页码:425-428 |
| 关键词 | carbon nitride tribological property unbalanced magnetron sputtering cyclotron-resonance plasma raman-spectroscopy thin-films c-n nitrogen |
| ISSN号 | 1009-0630 |
| 中文摘要 | Carbon nitride films were deposited by a twinned microwave electron cyclotron resonance (ECR) plasma source enhanced unbalanced magnetron sputtering system. The results indicate that the structure of the films is sensitive to the nitrogen content. The increase in the nitrogen flow ratio leads to an increase in the sp(3) content and an improvement of the tribological properties. |
| 原文出处 | |
| 公开日期 | 2012-04-13 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/34214]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | P. Gao,J. Xu,Y. Piao,et al. Structure and tribology property of carbon nitride films deposited by MW-ECR plasma enhanced unbalanced magnetron sputtering[J]. Plasma Science & Technology,2006,8(4):425-428. |
| APA | P. Gao,J. Xu,Y. Piao,W. Y. Ding,X. L. Deng,&C. Dong.(2006).Structure and tribology property of carbon nitride films deposited by MW-ECR plasma enhanced unbalanced magnetron sputtering.Plasma Science & Technology,8(4),425-428. |
| MLA | P. Gao,et al."Structure and tribology property of carbon nitride films deposited by MW-ECR plasma enhanced unbalanced magnetron sputtering".Plasma Science & Technology 8.4(2006):425-428. |
入库方式： OAI收割
来源：金属研究所
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