Improved corrosion behavior of nanocrystalline Cu-20Zr films in HCl solution
文献类型：期刊论文
| 作者 | H. B. Lu ; L. Ying ; F. H. Wang |
| 刊名 | Thin Solid Films
 |
| 出版日期 | 2006 |
| 卷号 | 510期号:1-2页码:197-202 |
| 关键词 | Cu-Zr alloy nanostructure corrosion electrochemistry electrochemical impedance chloride media copper alloy nickel products steels |
| ISSN号 | 0040-6090 |
| 中文摘要 | Nanocrystalline Cu-20Zr (wt.%) films were obtained from the cast master alloy by magnetron sputtering. Potentiodynamic polarization, electrochemical impedance spectroscopy, and scanning electron microscopy were employed to characterize the Corrosion behavior of the sputtered nanocrystalline Cu-20Zr films and the corresponding cast Cu-20Zr alloy in HCl aqueous solutions with various concentrations (0.1, 0.5 and 1.0 mol L-1). Results showed that the corrosion resistance of the sputtered nanocrystalline Cu-20Zr films is superior to that of the cast Cu-20Zr alloy. The improvement of the corrosion resistance through nanocrystallization is explained by (i) the formation of a continuous Cu-rich layer at the corrosion potential, and (ii) the formation of a copper-chloride complex layer in the potential range for simultaneous dissolution of Cu and Zr. (c) 2006 Elsevier B.V. All rights reserved. |
| 原文出处 | |
| 公开日期 | 2012-04-13 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/34381]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | H. B. Lu,L. Ying,F. H. Wang. Improved corrosion behavior of nanocrystalline Cu-20Zr films in HCl solution[J]. Thin Solid Films,2006,510(1-2):197-202. |
| APA | H. B. Lu,L. Ying,&F. H. Wang.(2006).Improved corrosion behavior of nanocrystalline Cu-20Zr films in HCl solution.Thin Solid Films,510(1-2),197-202. |
| MLA | H. B. Lu,et al."Improved corrosion behavior of nanocrystalline Cu-20Zr films in HCl solution".Thin Solid Films 510.1-2(2006):197-202. |
入库方式： OAI收割
来源：金属研究所
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