Growth of intermetallic layer in multi-laminated Ti/Al diffusion couples
文献类型：期刊论文
| 作者 | L. Xu ; Y. Y. Cui ; Y. L. Hao ; R. Yang |
| 刊名 | Materials Science and Engineering a-Structural Materials Properties Microstructure and Processing
 |
| 出版日期 | 2006 |
| 卷号 | 435页码:638-647 |
| 关键词 | growth behavior TiAl3 layer Ti/Al diffusion couples phase prediction titanium-aluminum system phase formation sequence thin-film systems ti-al system soldering reaction mil composites formation rule effective heat eutectic snpb tial3 layer |
| ISSN号 | 0921-5093 |
| 中文摘要 | Solid-state reactive diffusion between Ti and Al was investigated in the temperature range of 520-650 degrees C by employing multi-laminated Ti/Al diffusion couples. In samples annealed up to 150 h intermetallic TiAl3 is the only phase observed in the diffusion zone and the preferential formation of this compound in Ti/Al diffusion couples was predicted using an effective heat of formation model. The present work indicated that both Ti and Al diffused into each other and the growth of the TiAl3 layers occurred mainly towards the Al side. The TiAl3 growth changes from parabolic to linear kinetics between 575 and 600 degrees C, characterized by activation energy of 33.2 and 295.8 kJ mol(-1), respectively. It is suggested that the low-temperature kinetics is dominated by the diffusion of Ti atoms along the grain boundaries of the TiAl3 layers, while the reaction at the TiAl3/Al interfaces in the high-temperature regime is limited by the diffusion of Ti atoms in the Al foils as a result of increased solubility of Ti in Al with increasing temperature. (c) 2006 Elsevier B.V. All rights reserved. |
| 原文出处 | |
| 公开日期 | 2012-04-14 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/34627]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | L. Xu,Y. Y. Cui,Y. L. Hao,et al. Growth of intermetallic layer in multi-laminated Ti/Al diffusion couples[J]. Materials Science and Engineering a-Structural Materials Properties Microstructure and Processing,2006,435:638-647. |
| APA | L. Xu,Y. Y. Cui,Y. L. Hao,&R. Yang.(2006).Growth of intermetallic layer in multi-laminated Ti/Al diffusion couples.Materials Science and Engineering a-Structural Materials Properties Microstructure and Processing,435,638-647. |
| MLA | L. Xu,et al."Growth of intermetallic layer in multi-laminated Ti/Al diffusion couples".Materials Science and Engineering a-Structural Materials Properties Microstructure and Processing 435(2006):638-647. |
入库方式： OAI收割
来源：金属研究所
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