中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Effect of annealing close to T(g) on notch fracture toughness of Pd-based thin-film metallic glass for MEMS applications

文献类型:期刊论文

作者G. P. Zhang ; Y. Liu ; B. Zhang
刊名Scripta Materialia
出版日期2006
卷号54期号:5页码:897-901
关键词notch fracture toughness shear bands thin-film metallic glasses annealing effects ni-cu-be amorphous alloy deformation flow behavior state tests beams
ISSN号1359-6462
中文摘要Notch fracture toughness of Pd-based thin-film metallic glasses, prepared both as-deposited and annealed at 640 K close to the glass transition temperature (T(g) = 637 K), was examined by static bending tests. The experimental results show that the notch fracture toughness of thin-film metallic glasses decreased with increasing annealing time at 640 K. The fracture behaviors, the propensity for shear banding, as well as the variation of Young's modulus of Pd-based thin-film metallic glasses as a function of annealing time, were demonstrated to be correlated with fracture resistance. (c) 2005 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved.
原文出处://WOS:000234775400035
公开日期2012-04-14
源URL[http://ir.imr.ac.cn/handle/321006/34678]  
专题金属研究所_中国科学院金属研究所
推荐引用方式
GB/T 7714
G. P. Zhang,Y. Liu,B. Zhang. Effect of annealing close to T(g) on notch fracture toughness of Pd-based thin-film metallic glass for MEMS applications[J]. Scripta Materialia,2006,54(5):897-901.
APA G. P. Zhang,Y. Liu,&B. Zhang.(2006).Effect of annealing close to T(g) on notch fracture toughness of Pd-based thin-film metallic glass for MEMS applications.Scripta Materialia,54(5),897-901.
MLA G. P. Zhang,et al."Effect of annealing close to T(g) on notch fracture toughness of Pd-based thin-film metallic glass for MEMS applications".Scripta Materialia 54.5(2006):897-901.

入库方式: OAI收割

来源:金属研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。