Thickness-dependent structural transformation in the AlN film
文献类型：期刊论文
| 作者 | D. Chen ; X. L. Ma ; Y. M. Wang |
| 刊名 | Acta Materialia
 |
| 出版日期 | 2005 |
| 卷号 | 53期号:19页码:5223-5227 |
| 关键词 | epitaxially stabilized AlN structural transformation critical thickness chemical potential concepts bond-valence parameters aln/tin superlattices aluminum nitride atomistic simulations molecular-dynamics ionic-crystals cubic aln density phase |
| ISSN号 | 1359-6454 |
| 中文摘要 | We report the nature of the thick ness-dependent structural transformation in AlN film. The non-equilibrium cubic AlN, which normally exists under high pressures of more than 22.9 GPa, can be epitaxially stabilized in ambient atmosphere in the form of thin films grown on TiN substrate. A critical thickness, approximate to 1.95 nm, at which the pseudomorphic growth cannot be preserved and after which the cubic phase transforms into its hexagonal counterpart, has been quantified. Details of the structural transformation were simulated. The present studies, by means of crystal-chemical atomic dynamics based on the first-principles calculations, provide in situ physical details on an atomic scale of the thickness-dependent structural transformation, which are hardly observed in experiments. (c) 2005 Acta Materialia Inc. Published by Elsevier Ltd. All rights reserved. |
| 原文出处 | |
| 公开日期 | 2012-04-14 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/34804]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | D. Chen,X. L. Ma,Y. M. Wang. Thickness-dependent structural transformation in the AlN film[J]. Acta Materialia,2005,53(19):5223-5227. |
| APA | D. Chen,X. L. Ma,&Y. M. Wang.(2005).Thickness-dependent structural transformation in the AlN film.Acta Materialia,53(19),5223-5227. |
| MLA | D. Chen,et al."Thickness-dependent structural transformation in the AlN film".Acta Materialia 53.19(2005):5223-5227. |
入库方式： OAI收割
来源：金属研究所
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