Monte Carlo simulation of the spontaneous oscillation in electrochemical deposition
文献类型：期刊论文
| 作者 | M. J. Ha ; F. Fang ; J. M. Liu ; M. Wang |
| 刊名 | European Physical Journal D
 |
| 出版日期 | 2005 |
| 卷号 | 34期号:1-3页码:195-198 |
| 关键词 | layered nanostructures copper electrodeposition |
| ISSN号 | 1434-6060 |
| 中文摘要 | We report a new Monte Carlo model to simulate the spontaneous oscillating growth in Cu(II)-acid electrochemical deposition system, and present the one-to-one correspondence between the oscillation of pH and the layered structure. Two mechanisms essential for the oscillation behavior, i.e. the adsorption and buffering, are incorporated into the deposition sequences. The simulation results are qualitatively in agreement with the experimental observations. Some system parameters essential for the oscillation generation are discussed. And through adjusting the adsorption ratio, the spatially columnar deposited structure is generated and the columnar alternative growth of copper and cuprous oxide phases is achieved. |
| 原文出处 | |
| 公开日期 | 2012-04-14 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/34860]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | M. J. Ha,F. Fang,J. M. Liu,et al. Monte Carlo simulation of the spontaneous oscillation in electrochemical deposition[J]. European Physical Journal D,2005,34(1-3):195-198. |
| APA | M. J. Ha,F. Fang,J. M. Liu,&M. Wang.(2005).Monte Carlo simulation of the spontaneous oscillation in electrochemical deposition.European Physical Journal D,34(1-3),195-198. |
| MLA | M. J. Ha,et al."Monte Carlo simulation of the spontaneous oscillation in electrochemical deposition".European Physical Journal D 34.1-3(2005):195-198. |
入库方式： OAI收割
来源：金属研究所
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