Substrate temperature calculation for pulsed bias arc ion plating
文献类型：期刊论文
| 作者 | G. Q. Lin ; X. Bai ; C. Dong ; W. Lishi ; L. H. Wen |
| 刊名 | Surface & Coatings Technology
 |
| 出版日期 | 2005 |
| 卷号 | 194期号:2-3页码:325-329 |
| 关键词 | substrate temperature arc ion plating pulsed bias tin deposition voltage |
| ISSN号 | 0257-8972 |
| 中文摘要 | The main factors influencing substrate temperature such as ion bombardment, heat radiation, and heat conductivity are analyzed for Pulsed-Bias Arc Ion Plating (PBAIP). The wave profile of the pulsed bias voltage, varying from -1000 to 0 V, is basically rectangle. This characteristic periodic energy input has an average energy density being equal to the product of that of the DC Arc Ion Plating (DCAIP) and the duty cycle in PBAIP. A temperature model based on energy conservation for the substrate temperature is thus established, which incorporates input ion power, heat radiation and heat conductivity. Experiments are also conducted to verify the calculation. (c) 2004 Elsevier B.V. All rights reserved. |
| 原文出处 | |
| 公开日期 | 2012-04-14 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/34923]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | G. Q. Lin,X. Bai,C. Dong,et al. Substrate temperature calculation for pulsed bias arc ion plating[J]. Surface & Coatings Technology,2005,194(2-3):325-329. |
| APA | G. Q. Lin,X. Bai,C. Dong,W. Lishi,&L. H. Wen.(2005).Substrate temperature calculation for pulsed bias arc ion plating.Surface & Coatings Technology,194(2-3),325-329. |
| MLA | G. Q. Lin,et al."Substrate temperature calculation for pulsed bias arc ion plating".Surface & Coatings Technology 194.2-3(2005):325-329. |
入库方式： OAI收割
来源：金属研究所
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