Ion-plated Al-O-N and Cr-O-N films on Ni-base superalloys as diffusion barriers
文献类型：期刊论文
| 作者 | Q. M. Wang ; Y. N. Wu ; M. H. Guo ; P. L. Ke ; J. Gong ; C. Sun ; L. S. Wen |
| 刊名 | Surface & Coatings Technology
 |
| 出版日期 | 2005 |
| 卷号 | 197期号:1页码:68-76 |
| 关键词 | Al-O-N Cr-O-N diffusion barrier arc ion plating (AIP) thermal-stability coatings interdiffusion titanium design |
| ISSN号 | 0257-8972 |
| 中文摘要 | Al-O-N and Cr-O-N films were deposited as diffusion barriers between NiCoCrAlY overlay coating and Ni-base superalloy DSM I I using arc ion plating (AIP) techniques. The efficiency of the diffusion barriers was investigated at 1050 and 900 ° C. The results showed that the Al-O-N barrier could inhibit the interdiffusion of the alloying elements. Unfortunately, because of deterioration of the mechanical and oxidation properties of the whole system, it could not act as a successful barrier. The Cr-O-N film could act as an active diffusion barrier by changing into an Al-rich oxide layer in high temperature annealing. The achieved interface structure can offer both the barrier properties of a dense ceramic layer and strong bond strength of a reaction-bonding zone. In addition, Cr-O-N films could improve the oxidation properties of the NiCoCrAlY coatings by 18-37%, which were influenced by the original chemical compositions of the Cr-O-N films. © 2004 Elsevier B.V. All rights reserved. |
| 原文出处 | |
| 公开日期 | 2012-04-14 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/35091]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | Q. M. Wang,Y. N. Wu,M. H. Guo,et al. Ion-plated Al-O-N and Cr-O-N films on Ni-base superalloys as diffusion barriers[J]. Surface & Coatings Technology,2005,197(1):68-76. |
| APA | Q. M. Wang.,Y. N. Wu.,M. H. Guo.,P. L. Ke.,J. Gong.,...&L. S. Wen.(2005).Ion-plated Al-O-N and Cr-O-N films on Ni-base superalloys as diffusion barriers.Surface & Coatings Technology,197(1),68-76. |
| MLA | Q. M. Wang,et al."Ion-plated Al-O-N and Cr-O-N films on Ni-base superalloys as diffusion barriers".Surface & Coatings Technology 197.1(2005):68-76. |
入库方式： OAI收割
来源：金属研究所
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