中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Experimental verification of the physical model for droplet-particles cleaning in pulsed bias arc ion plating

文献类型:期刊论文

作者Y. H. Zhao ; G. Q. Lin ; C. Dong ; L. S. Wen
刊名Journal of Materials Science & Technology
出版日期2005
卷号21期号:3页码:423-426
关键词arc ion plating pulsed bias TiN film droplet-particles tin deposition mechanism coatings voltage
ISSN号1005-0302
中文摘要It has been reported that application of pulsed biases in arc ion plating could effectively eliminate droplet particles. The present paper aims at experimental verification of a physical model proposed previously by us which is based on particle charging and repulsion in the pulsed plasma sheath. An orthogonal experiment was designed for this purpose, using the electrical parameters of the pulsed bias for the deposition of TiN films on stainless steel substrates. The effect of these parameters on the amount and the size distribution of the particles were analyzed, and the results provided sufficient evidence for the physical model.
原文出处://WOS:000229594400029
公开日期2012-04-14
源URL[http://ir.imr.ac.cn/handle/321006/35272]  
专题金属研究所_中国科学院金属研究所
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Y. H. Zhao,G. Q. Lin,C. Dong,et al. Experimental verification of the physical model for droplet-particles cleaning in pulsed bias arc ion plating[J]. Journal of Materials Science & Technology,2005,21(3):423-426.
APA Y. H. Zhao,G. Q. Lin,C. Dong,&L. S. Wen.(2005).Experimental verification of the physical model for droplet-particles cleaning in pulsed bias arc ion plating.Journal of Materials Science & Technology,21(3),423-426.
MLA Y. H. Zhao,et al."Experimental verification of the physical model for droplet-particles cleaning in pulsed bias arc ion plating".Journal of Materials Science & Technology 21.3(2005):423-426.

入库方式: OAI收割

来源:金属研究所

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