Introduction of helium into metals by magnetron sputtering deposition method
文献类型：期刊论文
| 作者 | H. Zheng ; S. Liu ; H. B. Yu ; L. B. Wang ; C. Z. Liu ; L. Q. Shi |
| 刊名 | Materials Letters
 |
| 出版日期 | 2005 |
| 卷号 | 59期号:8-9页码:1071-1075 |
| 关键词 | helium Ti film magnetron sputtering thermodesorption solid-phases titanium tritide bubbles energy |
| ISSN号 | 0167-577X |
| 中文摘要 | High concentration helium, up to 16 at.%, was introduced into Ti films through magnetron sputtering method in a He/Ar complex atmosphere. The introduced helium distributes homogeneously in the films and mainly forms small helium bubbles. Helium thermodesorption experiments were carried out, from which it was found that the thermodesorption properties of the introduced 4 He are similar to those of radiogenic He-3 in titanium tritides. Titanium alloy films containing helium were also prepared through this way and a comparison of thermodesorption properties was made between them and Ti-He films. (C) 2004 Elsevier B.V. All rights reserved. |
| 原文出处 | |
| 公开日期 | 2012-04-14 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/35275]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | H. Zheng,S. Liu,H. B. Yu,et al. Introduction of helium into metals by magnetron sputtering deposition method[J]. Materials Letters,2005,59(8-9):1071-1075. |
| APA | H. Zheng,S. Liu,H. B. Yu,L. B. Wang,C. Z. Liu,&L. Q. Shi.(2005).Introduction of helium into metals by magnetron sputtering deposition method.Materials Letters,59(8-9),1071-1075. |
| MLA | H. Zheng,et al."Introduction of helium into metals by magnetron sputtering deposition method".Materials Letters 59.8-9(2005):1071-1075. |
入库方式： OAI收割
来源：金属研究所
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