Pitting corrosion induced current oscillations during electrodissolution of Al in HCIO4 solutions
文献类型：期刊论文
| 作者 | L. Li ; S. H. Chen ; X. G. Yang ; C. Wang ; W. J. Guo |
| 刊名 | Journal of Electroanalytical Chemistry
 |
| 出版日期 | 2004 |
| 卷号 | 572期号:1页码:41-49 |
| 关键词 | Al electrodissolution current oscillations pitting corrosion HCIO4 point-defect model passive-active transition sulfuric-acid-solutions mass-transport control anodic-oxidation pure aluminum clo4-ions iron inhibition dissolution |
| ISSN号 | 0022-0728 |
| 中文摘要 | In this paper, oscillatory electrodissolution of Al in perchloric acid solutions has been investigated. The Al/HClO4 system is a new electrochemical oscillator and particularly, current oscillations occur over a large range of HClO4 concentration and over a wide scale of applied potential. The effects of the applied potential and the HClO4 concentration on the current oscillations have been studied. The results are discussed in terms of the formation and dissolution of the surface oxide film. During the anodic dissolution of the Al electrode in HClO4 solutions, perchlorate ions are reduced to chloride ions, by which, pitting corrosion is induced. The surface morphologies of Al electrodes observed using an environmental scanning electron micrograph show that it is pitting corrosion that induces the current oscillations. (C) 2004 Published by Elsevier B.V. |
| 原文出处 | |
| 公开日期 | 2012-04-14 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/35407]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | L. Li,S. H. Chen,X. G. Yang,et al. Pitting corrosion induced current oscillations during electrodissolution of Al in HCIO4 solutions[J]. Journal of Electroanalytical Chemistry,2004,572(1):41-49. |
| APA | L. Li,S. H. Chen,X. G. Yang,C. Wang,&W. J. Guo.(2004).Pitting corrosion induced current oscillations during electrodissolution of Al in HCIO4 solutions.Journal of Electroanalytical Chemistry,572(1),41-49. |
| MLA | L. Li,et al."Pitting corrosion induced current oscillations during electrodissolution of Al in HCIO4 solutions".Journal of Electroanalytical Chemistry 572.1(2004):41-49. |
入库方式： OAI收割
来源：金属研究所
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