Defects and electron densities in TiAl-based alloys containing Mn and Cu studied by positron annihilation
文献类型:期刊论文
作者 | W. Deng ; D. K. Xiong ; J. Y. Wang ; L. Y. Xiong ; M. Z. Cao ; C. W. Lung |
刊名 | Journal of Materials Science & Technology
![]() |
出版日期 | 2003 |
卷号 | 19期号:2页码:164-166 |
关键词 | TiAl electron density defect intermetallic compound |
ISSN号 | 1005-0302 |
中文摘要 | The defects and electron densities in Ti50Al50, Ti50Al48Mn2 and Ti50Al48Cu2 alloys have been studied by positron lifetime measurements. The results show that the free electron density in the bulk of binary TiAl alloy is lower than that of pure Ti or Al metal. The open volume of defects on the grain boundaries of binary TiAl alloy is larger than that of a monovacancy of Al metal. The additions of Mn and Cu into Ti-rich TiAl alloy will increase the free electron densities in the bulk and the grain boundary simultaneously, since one Mn atom or Cu atom which occupies the Al atom site provides more free electrons participating metallic bonds than those provided by an Al atom. It is also found the free electron density in the grain boundary of Ti50Al48Cu2 Is higher than that of Ti50Al48Mn2 alloy, while the free electron density in the bulk of Ti50Al48Cu2 Is lower than that of Ti50Al48Mn2 alloy. The behaviors of Mn and Cu atoms in TiAl alloy have been discussed. |
原文出处 | |
公开日期 | 2012-04-14 |
源URL | [http://ir.imr.ac.cn/handle/321006/35807] ![]() |
专题 | 金属研究所_中国科学院金属研究所 |
推荐引用方式 GB/T 7714 | W. Deng,D. K. Xiong,J. Y. Wang,et al. Defects and electron densities in TiAl-based alloys containing Mn and Cu studied by positron annihilation[J]. Journal of Materials Science & Technology,2003,19(2):164-166. |
APA | W. Deng,D. K. Xiong,J. Y. Wang,L. Y. Xiong,M. Z. Cao,&C. W. Lung.(2003).Defects and electron densities in TiAl-based alloys containing Mn and Cu studied by positron annihilation.Journal of Materials Science & Technology,19(2),164-166. |
MLA | W. Deng,et al."Defects and electron densities in TiAl-based alloys containing Mn and Cu studied by positron annihilation".Journal of Materials Science & Technology 19.2(2003):164-166. |
入库方式: OAI收割
来源:金属研究所
浏览0
下载0
收藏0
其他版本
除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。