Effects of nitrogen partial pressure and pulse bias voltage on (Ti,AI)N coatings by arc ion plating
文献类型：期刊论文
| 作者 | M. S. Li ; F. H. Wang |
| 刊名 | Surface & Coatings Technology
 |
| 出版日期 | 2003 |
| 卷号 | 167期号:2-3页码:197-202 |
| 关键词 | arc ion plating (Ti Al)N coatings N-2 partial pressure pulse bias voltage films |
| ISSN号 | 0257-8972 |
| 中文摘要 | By virtue of the characteristics of arc ion plating (AIP) technique, the structure and composition of (Ti,Al)N coatings can be tailored by controlling N-2 partial pressure and substrate bias. In this study, (Ti,Al)N coatings were deposited on 1Crl 1Ni2W2MoV stainless steel by AIR The effects of substrate pulse bias and nitrogen partial pressure on the deposition rate, droplet formation, elemental composition and phase structure of the coatings were investigated. (C) 2002 Published by Elsevier Science B.V. |
| 原文出处 | |
| 公开日期 | 2012-04-14 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/35897]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | M. S. Li,F. H. Wang. Effects of nitrogen partial pressure and pulse bias voltage on (Ti,AI)N coatings by arc ion plating[J]. Surface & Coatings Technology,2003,167(2-3):197-202. |
| APA | M. S. Li,&F. H. Wang.(2003).Effects of nitrogen partial pressure and pulse bias voltage on (Ti,AI)N coatings by arc ion plating.Surface & Coatings Technology,167(2-3),197-202. |
| MLA | M. S. Li,et al."Effects of nitrogen partial pressure and pulse bias voltage on (Ti,AI)N coatings by arc ion plating".Surface & Coatings Technology 167.2-3(2003):197-202. |
入库方式： OAI收割
来源：金属研究所
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