Plasma load characteristics of pulsed-bias arc ion plating
文献类型：期刊论文
| 作者 | G. Q. Lin ; Z. F. Ding ; D. Qi ; Y. H. Zhao ; N. H. Wang ; C. Dong ; R. F. Huang ; L. S. Wen |
| 刊名 | Journal of Vacuum Science & Technology A
 |
| 出版日期 | 2003 |
| 卷号 | 21期号:5页码:1675-1679 |
| 关键词 | cathodic-arc surface modification implantation deposition voltage tin model |
| ISSN号 | 0734-2101 |
| 中文摘要 | In a pulsed-bias arc ion plating system, the load voltage and current in the substrate circuit manifest oscillation behaviors. A simple analogous electrical circuit model is then constructed, which consists of a pair of capacitor and resistor connected in parallel. The output of the analogous circuit reproduces the oscillation profiles measured from experiments. Finally, plasma sheath theory is used to explain the capacitance characteristic of the plasma load. (C) 2003 American Vacuum Society. |
| 原文出处 | |
| 公开日期 | 2012-04-14 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/35912]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | G. Q. Lin,Z. F. Ding,D. Qi,et al. Plasma load characteristics of pulsed-bias arc ion plating[J]. Journal of Vacuum Science & Technology A,2003,21(5):1675-1679. |
| APA | G. Q. Lin.,Z. F. Ding.,D. Qi.,Y. H. Zhao.,N. H. Wang.,...&L. S. Wen.(2003).Plasma load characteristics of pulsed-bias arc ion plating.Journal of Vacuum Science & Technology A,21(5),1675-1679. |
| MLA | G. Q. Lin,et al."Plasma load characteristics of pulsed-bias arc ion plating".Journal of Vacuum Science & Technology A 21.5(2003):1675-1679. |
入库方式： OAI收割
来源：金属研究所
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