A new approach for preparing effective inhibition film on copper based on self-assembled process
文献类型：期刊论文
| 作者 | C. T. Wang ; S. H. Chen |
| 刊名 | Chinese Chemical Letters
 |
| 出版日期 | 2003 |
| 卷号 | 14期号:3页码:308-311 |
| 关键词 | self-assembly phenylthiourea (PT) 1-dodecanethiol (DT) AC voltage protection alkanethiols monolayer corrosion |
| ISSN号 | 1001-8417 |
| 中文摘要 | A new method for preparing effective inhibition film on copper has been developed. Phenylthiourea (PT) was first absorbed to copper surface to form a monolayer. 1-Dodecanethiol (DT) was then assembled on the surface for modification. Finally, AC voltage was loaded on copper covered the mixed film to improve it further. After these processes, an effective inhibition film was gained because of its high charge transfer resistance and low corrosion current density shown in electrochemical impedance spectra and polarization. The inhibition efficiency was more than 97%. |
| 原文出处 | |
| 公开日期 | 2012-04-14 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/36038]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | C. T. Wang,S. H. Chen. A new approach for preparing effective inhibition film on copper based on self-assembled process[J]. Chinese Chemical Letters,2003,14(3):308-311. |
| APA | C. T. Wang,&S. H. Chen.(2003).A new approach for preparing effective inhibition film on copper based on self-assembled process.Chinese Chemical Letters,14(3),308-311. |
| MLA | C. T. Wang,et al."A new approach for preparing effective inhibition film on copper based on self-assembled process".Chinese Chemical Letters 14.3(2003):308-311. |
入库方式： OAI收割
来源：金属研究所
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