Inhibition effect of allylthiourea and 1-dodecanethiol on copper corrosion
文献类型:期刊论文
作者 | C. T. Wang ; S. H. Chen ; S. Y. Zhao ; D. G. Li |
刊名 | Acta Chimica Sinica
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出版日期 | 2003 |
卷号 | 61期号:2页码:151-155 |
关键词 | self-assembly electrochemical impedance spectroscopy AC treatment inhibition efficiency self-assembled monolayers impedance spectroscopy acid-solution gold protection alkanethiols electrode thiourea electrodissolution mechanisms |
ISSN号 | 0567-7351 |
中文摘要 | Self-assembled monolayer of allylthiourea (AT) was first formed on copper surface. 1-Dodecanethiol (DT) was then self-assembled on the surface for subsequent modification: Finally, AC voltage was loaded on copper covered with the mixed film for further improvement. After these processes, an effective inhibition film was obtained as indicated by the high charge-transfer resistance shown in electrochemical impedance spectroscopy and low corrosion current density in polarization curves. The maximum coverage and inhibition efficiency for copper corrosion was 98.6% and 98.5%, respectively. The mixed film was stable in a wide range of potential before and after AC voltage treatment. |
原文出处 | |
公开日期 | 2012-04-14 |
源URL | [http://ir.imr.ac.cn/handle/321006/36040] ![]() |
专题 | 金属研究所_中国科学院金属研究所 |
推荐引用方式 GB/T 7714 | C. T. Wang,S. H. Chen,S. Y. Zhao,et al. Inhibition effect of allylthiourea and 1-dodecanethiol on copper corrosion[J]. Acta Chimica Sinica,2003,61(2):151-155. |
APA | C. T. Wang,S. H. Chen,S. Y. Zhao,&D. G. Li.(2003).Inhibition effect of allylthiourea and 1-dodecanethiol on copper corrosion.Acta Chimica Sinica,61(2),151-155. |
MLA | C. T. Wang,et al."Inhibition effect of allylthiourea and 1-dodecanethiol on copper corrosion".Acta Chimica Sinica 61.2(2003):151-155. |
入库方式: OAI收割
来源:金属研究所
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