中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Inhibitive self-assembled monolayers on metal surface

文献类型:期刊论文

作者X. G. Yang ; S. H. Chen ; H. Y. Ma ; Z. L. Quan ; D. G. Li
刊名Progress in Chemistry
出版日期2003
卷号15期号:2页码:123-128
关键词self-assembled monolayers corrosion and protection of metal inhibitors schiff-base copper corrosion chemical modification alkanethiol monolayer protection films electrodes mechanism silver iron
ISSN号1005-281X
中文摘要Self-assembled monolayers (SAMs) play an important role in surface science, chemical engineering and materials science because of their relevance to both applied and fundamental studies. In this paper the application of self-assembled monolayers in the field of corrosion and protection of metals in recent years is summarized. Some representative self-assembly systems are introduced in detail. In addition, some common characterization technologies are evaluated, and the research results of our group are presented. The development of this technique in the future is also predicted.
原文出处://WOS:000181960000006
公开日期2012-04-14
源URL[http://ir.imr.ac.cn/handle/321006/36120]  
专题金属研究所_中国科学院金属研究所
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X. G. Yang,S. H. Chen,H. Y. Ma,et al. Inhibitive self-assembled monolayers on metal surface[J]. Progress in Chemistry,2003,15(2):123-128.
APA X. G. Yang,S. H. Chen,H. Y. Ma,Z. L. Quan,&D. G. Li.(2003).Inhibitive self-assembled monolayers on metal surface.Progress in Chemistry,15(2),123-128.
MLA X. G. Yang,et al."Inhibitive self-assembled monolayers on metal surface".Progress in Chemistry 15.2(2003):123-128.

入库方式: OAI收割

来源:金属研究所

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