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Adsorption behaviour of Schiff base and corrosion protection of resulting films to copper substrate

文献类型:期刊论文

作者Z. L. Quan ; S. H. Chen ; L. Li ; X. G. Cui
刊名Corrosion Science
出版日期2002
卷号44期号:4页码:703-715
关键词self-assembly Schiff base copper corrosion alkanethiol self-assembled monolayers hydrochloric-acid solution gold alkanethiols impedance surfaces electrodissolution dissolution mechanisms kinetics
ISSN号0010-938X
中文摘要Self-assembled (SA) films of Schiff base were prepared on the copper surface. The corrosion protection abilities of SA films in chloride solution were evaluated using electrochemical impedance spectroscopy and polarization curves. A subsequent adsorption of 1-dodecanethiol on the original SA films of Schiff base improved significantly the protection ability to the copper substrate. The behavior of Schiff base adsorption on copper surface and subsequent adsorption of 1-dodecanethiol was probed by X-ray photoelectron spectroscopy. It was found that copper exists mainly in Cu(I) state in the SA films of Schiff base, and the thiol molecules subsequently adsorbed was bonded directly on copper surface rather than physisorbed on the previous SA films. (C) 2002 Elsevier Science Ltd. All rights reserved.
原文出处://WOS:000173629900005
公开日期2012-04-14
源URL[http://ir.imr.ac.cn/handle/321006/36403]  
专题金属研究所_中国科学院金属研究所
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GB/T 7714
Z. L. Quan,S. H. Chen,L. Li,et al. Adsorption behaviour of Schiff base and corrosion protection of resulting films to copper substrate[J]. Corrosion Science,2002,44(4):703-715.
APA Z. L. Quan,S. H. Chen,L. Li,&X. G. Cui.(2002).Adsorption behaviour of Schiff base and corrosion protection of resulting films to copper substrate.Corrosion Science,44(4),703-715.
MLA Z. L. Quan,et al."Adsorption behaviour of Schiff base and corrosion protection of resulting films to copper substrate".Corrosion Science 44.4(2002):703-715.

入库方式: OAI收割

来源:金属研究所

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