Properties of TiO2 thin films prepared by magnetron sputtering
文献类型：期刊论文
| 作者 | W. J. Zhang ; Y. Li ; F. H. Wang |
| 刊名 | Journal of Materials Science & Technology
 |
| 出版日期 | 2002 |
| 卷号 | 18期号:2页码:101-107 |
| 关键词 | TiO2 thin film magnetron sputtering deposition process composite film optical-properties heterogeneous photocatalysis substrate-temperature cosputtering method titanium-dioxide deposition oxidation frequency water ion |
| ISSN号 | 1005-0302 |
| 中文摘要 | With rapid progressive application of TiO2 thin films, magnetron sputtering becomes a very interesting method to prepare such multi-functional thin films. This paper focuses on influences of various deposition processes and deposition rate on the structures and properties of TiO2 thin films. Anatase, rutile or amorphous TiO2 films with various crystalline structures and different photocatalytic, optical and electrical properties can be produced by varying sputtering gases, substrate temperature, annealing process, deposition rate and the characteristics of magnetron sputtering. This may in turn affect the functions of TiO2 films in many applications. Furthermore, TiO2-based composites films can overcome many limitations and improve the properties of TiO2 films. |
| 原文出处 | |
| 公开日期 | 2012-04-14 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/36551]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | W. J. Zhang,Y. Li,F. H. Wang. Properties of TiO2 thin films prepared by magnetron sputtering[J]. Journal of Materials Science & Technology,2002,18(2):101-107. |
| APA | W. J. Zhang,Y. Li,&F. H. Wang.(2002).Properties of TiO2 thin films prepared by magnetron sputtering.Journal of Materials Science & Technology,18(2),101-107. |
| MLA | W. J. Zhang,et al."Properties of TiO2 thin films prepared by magnetron sputtering".Journal of Materials Science & Technology 18.2(2002):101-107. |
入库方式： OAI收割
来源：金属研究所
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