中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Lattice-distortion-induced amorphization in indented 110 silicon

文献类型:期刊论文

作者Y. Q. Wu ; Y. B. Xu
刊名Journal of Materials Research
出版日期1999
卷号14期号:3页码:682-687
关键词electron-microscopy crystal indentations transitions phases
ISSN号0884-2914
中文摘要High resolution transmission electron microscopy (HRTEM) is used to reveal fine structures of amorphous silicon induced by Vickers indentation and its interface with unindented silicon matrix. Deformation microtwins at the interface and continuous transition from lattice structure of crystal into amorphous structure at the interface are observed. Within the amorphous silicon near the periphery of the indented region, there are many clusters characterized by distorted silicon lattice. A possible mechanism of lattice-distortion-induced amorphization at the periphery of indented silicon is suggested. All the indentations are performed at ambient temperature.
原文出处://WOS:000082550300008
公开日期2012-04-14
源URL[http://ir.imr.ac.cn/handle/321006/37537]  
专题金属研究所_中国科学院金属研究所
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Y. Q. Wu,Y. B. Xu. Lattice-distortion-induced amorphization in indented 110 silicon[J]. Journal of Materials Research,1999,14(3):682-687.
APA Y. Q. Wu,&Y. B. Xu.(1999).Lattice-distortion-induced amorphization in indented 110 silicon.Journal of Materials Research,14(3),682-687.
MLA Y. Q. Wu,et al."Lattice-distortion-induced amorphization in indented 110 silicon".Journal of Materials Research 14.3(1999):682-687.

入库方式: OAI收割

来源:金属研究所

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