Molecular dynamics simulation of the isotopic mass effect in zero-fluence and low-bombarding-energy sputtering
文献类型:期刊论文
作者 | L. P. Zheng ; S. Qiu ; S. Y. Li |
刊名 | Applied Surface Science
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出版日期 | 1999 |
卷号 | 143期号:1-4页码:215-218 |
关键词 | molecular dynamics simulation isotopic mass effect zero-fluence low-bombarding-energy sputtering mo-92-mo-100 fractionation mixtures |
ISSN号 | 0169-4332 |
中文摘要 | Nonstoichiometric effects in the zero-fluence sputtering of a natural Cu(111) target (69.1% Cu-63, 30.9% Cu-65) irradiated with normally incident Ar+ ions from 50 to 1000 eV have been studied by use of a molecular dynamics (MD) simulation code. Calculations show that the isotopic ratios in the normal direction and at oblique angles, their difference, and the total isotopic ratio increase as the bombarding energy decreases. (C) 1999 Elsevier Science B.V. All rights reserved. |
原文出处 | |
公开日期 | 2012-04-14 |
源URL | [http://ir.imr.ac.cn/handle/321006/37594] ![]() |
专题 | 金属研究所_中国科学院金属研究所 |
推荐引用方式 GB/T 7714 | L. P. Zheng,S. Qiu,S. Y. Li. Molecular dynamics simulation of the isotopic mass effect in zero-fluence and low-bombarding-energy sputtering[J]. Applied Surface Science,1999,143(1-4):215-218. |
APA | L. P. Zheng,S. Qiu,&S. Y. Li.(1999).Molecular dynamics simulation of the isotopic mass effect in zero-fluence and low-bombarding-energy sputtering.Applied Surface Science,143(1-4),215-218. |
MLA | L. P. Zheng,et al."Molecular dynamics simulation of the isotopic mass effect in zero-fluence and low-bombarding-energy sputtering".Applied Surface Science 143.1-4(1999):215-218. |
入库方式: OAI收割
来源:金属研究所
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