中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Molecular dynamics simulation of zero-fluence and low-bombarding-energy Cu-63-Cu-65 sputtering

文献类型:期刊论文

作者L. P. Zheng ; S. Qiu ; Y. K. Zu ; R. S. Li
刊名Journal of Materials Science & Technology
出版日期1999
卷号15期号:2页码:184-186
关键词isotope fractionation mo-92-mo-100 mixtures
ISSN号1005-0302
中文摘要A molecular dynamics simulation has been used to study zero-fluence and low- bombarding-energy Cu-63-Cu-65 sputtering. Calculations show that the isotopic ratios at both theta less than or equal to 35 degrees and theta >35 degrees, and the total isotopic ratio increase when the bombarding energy decreases. This result might imply the existence of the bombarding-energy-dependent momentum asymmetry.
原文出处://WOS:000079552000017
公开日期2012-04-14
源URL[http://ir.imr.ac.cn/handle/321006/37595]  
专题金属研究所_中国科学院金属研究所
推荐引用方式
GB/T 7714
L. P. Zheng,S. Qiu,Y. K. Zu,et al. Molecular dynamics simulation of zero-fluence and low-bombarding-energy Cu-63-Cu-65 sputtering[J]. Journal of Materials Science & Technology,1999,15(2):184-186.
APA L. P. Zheng,S. Qiu,Y. K. Zu,&R. S. Li.(1999).Molecular dynamics simulation of zero-fluence and low-bombarding-energy Cu-63-Cu-65 sputtering.Journal of Materials Science & Technology,15(2),184-186.
MLA L. P. Zheng,et al."Molecular dynamics simulation of zero-fluence and low-bombarding-energy Cu-63-Cu-65 sputtering".Journal of Materials Science & Technology 15.2(1999):184-186.

入库方式: OAI收割

来源:金属研究所

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