中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Calculation of sputtering yields under high-fluence bombardment of a CuxN1-x alloy

文献类型:期刊论文

作者L. P. Zheng ; R. S. Li ; M. Y. Li
刊名Vacuum
出版日期1998
卷号51期号:3页码:413-416
关键词surface segregation eutectic alloy implantation simulations
ISSN号0042-207X
中文摘要Under 2 keV Ar ion bombardment of a CuxNi1-x alloy, at high fluence and at low temperature, Cu and Ni sputtering yields, the total sputtering yield (Cu+Ni yields), and the sputtering yields from the first surface layer and from beneath this layer for Cu and Ni, have been separately calculated by an improved kinetic BIGS (bombardment-induced Gibbsian segregation) model. Calculations indicate that these sputtering yields are strongly dependant on the Cu (segregating species) bulk composition. A cause of the possible correlation between sputtering angular distribution and bulk composition of the segregating species is also analysed for the segregating system. (C) 1998 Elsevier Science Ltd. All rights reserved.
原文出处://WOS:000077209100016
公开日期2012-04-14
源URL[http://ir.imr.ac.cn/handle/321006/37903]  
专题金属研究所_中国科学院金属研究所
推荐引用方式
GB/T 7714
L. P. Zheng,R. S. Li,M. Y. Li. Calculation of sputtering yields under high-fluence bombardment of a CuxN1-x alloy[J]. Vacuum,1998,51(3):413-416.
APA L. P. Zheng,R. S. Li,&M. Y. Li.(1998).Calculation of sputtering yields under high-fluence bombardment of a CuxN1-x alloy.Vacuum,51(3),413-416.
MLA L. P. Zheng,et al."Calculation of sputtering yields under high-fluence bombardment of a CuxN1-x alloy".Vacuum 51.3(1998):413-416.

入库方式: OAI收割

来源:金属研究所

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