中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Galvanostatic electrodeposition and microstructure of copper (I) oxide film

文献类型:期刊论文

作者Y. C. Zhou ; J. A. Switzer
刊名Materials Research Innovations
出版日期1998
卷号2期号:1页码:22-27
关键词copper(I) oxide electrochemical deposition thin films microstructure electrochemical synthesis thin-films
ISSN号1432-8917
中文摘要Polycrystalline copper (I) oxide films were deposited on stainless steel substrate by galvanostatic electrodeposition method and were characterized by Xray diffraction and scanning electron microscopy. The effect of bath temperature, bath pH and current density on the compositon, grain size, surface texture and surface morphology of the electrodeposited films were investigated. The films deposited at low bath pH (less than or equal to 7) consisted of copper (I) oxide and metallic copper; while the films deposited at bath pH between 8 and 12 and bath temperature of 60 degrees C were pure copper (I) oxide. The preferred orientation of the copper (I) oxide films depended on the relative growth rate of (111) and (200) faces and could be controlled by adjusting the bath pH and/or the cathodic current density. (100)-oriented copper (1) oxide films could be deposited at pH=9 and current densities in the range of 0.25-1 mA/cm(2) while (111)-oriented films could be prepared at pH=12 or at pH=9 using the current densities between 1.5-2.5 mA/cm(2). Computer simulated crystallite shapes showed that the crystal shape changed from octahedral for (100)-oriented film to trucated pyramids and cubs for (111)-oriented film. And they were approved by scanning electron microscopy.
原文出处://WOS:000074174400004
公开日期2012-04-14
源URL[http://ir.imr.ac.cn/handle/321006/37926]  
专题金属研究所_中国科学院金属研究所
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Y. C. Zhou,J. A. Switzer. Galvanostatic electrodeposition and microstructure of copper (I) oxide film[J]. Materials Research Innovations,1998,2(1):22-27.
APA Y. C. Zhou,&J. A. Switzer.(1998).Galvanostatic electrodeposition and microstructure of copper (I) oxide film.Materials Research Innovations,2(1),22-27.
MLA Y. C. Zhou,et al."Galvanostatic electrodeposition and microstructure of copper (I) oxide film".Materials Research Innovations 2.1(1998):22-27.

入库方式: OAI收割

来源:金属研究所

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