Structure and interdiffusion in sputtering-deposited Ag/Bi multilayers
文献类型：期刊论文
| 作者 | M. Zhang ; W. K. Wang |
| 刊名 | Physica Status Solidi a-Applied Research
 |
| 出版日期 | 1997 |
| 卷号 | 159期号:2页码:439-446 |
| 关键词 | x-ray-diffraction low-temperature average composition amorphous-silicon diffusion films interfaces |
| ISSN号 | 0031-8965 |
| 中文摘要 | Ln this paper, the structure and interdiffusion phenomenon in Ag/Bi multilayers are studied by using X-ray diffraction (XRD). The structure parameters of as-deposited Ag/Bi multilayers such as modulation period, average composition, interfacial roughness are determined. The internal structures in Ag/Bi multilayers are found to be obviously different when the substrates are cooled by liquid nitrogen and cooling water, respectively, during the deposition process. The relationship between the modulation period and interface conditions is discussed. In addition, an in-situ low-angle X-ray diffraction technique is developed to study the interdiffusion behavior in the Ag/Bi multilayers with nanometer scale modulation period and the results are discussed. |
| 原文出处 | |
| 公开日期 | 2012-04-14 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/38208]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | M. Zhang,W. K. Wang. Structure and interdiffusion in sputtering-deposited Ag/Bi multilayers[J]. Physica Status Solidi a-Applied Research,1997,159(2):439-446. |
| APA | M. Zhang,&W. K. Wang.(1997).Structure and interdiffusion in sputtering-deposited Ag/Bi multilayers.Physica Status Solidi a-Applied Research,159(2),439-446. |
| MLA | M. Zhang,et al."Structure and interdiffusion in sputtering-deposited Ag/Bi multilayers".Physica Status Solidi a-Applied Research 159.2(1997):439-446. |
入库方式： OAI收割
来源：金属研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。