中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Comparative study of ultraviolet emission with peak wavelengths around 350 nm from oxidized porous silicon and that from SiO2 powder

文献类型:期刊论文

作者G. G. Qin ; J. Lin ; J. Q. Duan ; G. Q. Yao
刊名Applied Physics Letters
出版日期1996
卷号69期号:12页码:1689-1691
ISSN号0003-6951
关键词light-emission visible luminescence optical-properties photoluminescence excitation mechanism centers films
中文摘要Ultraviolet (UV) light emission with almost the same peak wavelengths from thermally oxidized porous silicon (OPS) (340, 355, and 370 nm) and SiO2 powder (340, 350, and 370 nm) has been observed. Photoluminescence excitation spectra of OPS without Si nanoscale particles (SNP) and those of SiO2 powder are very similar, however, very different from those of the OPS with SNP. Three types of luminescence centers with luminescence wavelengths around 350 nm are responsible for UV light emission, and photoexcitation in OPS with SNP occurs in SNP-as well as in Si oxide layers covering SNP. (C) 1996 American Institute of Physics.
原文出处://WOS:A1996VG93400012
公开日期2012-04-14
源URL[http://ir.imr.ac.cn/handle/321006/38378]  
专题金属研究所_中国科学院金属研究所
推荐引用方式
GB/T 7714
G. G. Qin,J. Lin,J. Q. Duan,et al. Comparative study of ultraviolet emission with peak wavelengths around 350 nm from oxidized porous silicon and that from SiO2 powder[J]. Applied Physics Letters,1996,69(12):1689-1691.
APA G. G. Qin,J. Lin,J. Q. Duan,&G. Q. Yao.(1996).Comparative study of ultraviolet emission with peak wavelengths around 350 nm from oxidized porous silicon and that from SiO2 powder.Applied Physics Letters,69(12),1689-1691.
MLA G. G. Qin,et al."Comparative study of ultraviolet emission with peak wavelengths around 350 nm from oxidized porous silicon and that from SiO2 powder".Applied Physics Letters 69.12(1996):1689-1691.

入库方式: OAI收割

来源:金属研究所

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