中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
The microstructure of Ti-B-N film-substrate interfaces

文献类型:期刊论文

作者Q. Q. Yang ; L. H. Zhao ; H. Q. Du ; L. S. Wen
刊名Surface & Coatings Technology
出版日期1996
卷号81期号:2-3页码:287-289
ISSN号0257-8972
关键词interfaces ion bombardment microstructure coatings
中文摘要Ti-B-N films were deposited on W18Cr4V high speed steels by using N ion bombardment on an electron beam ion plated Ti-B film. Scanning electron microscopy and transmission electron microscopy morphology of the samples shows that the films are found to have a dense and fine nanocrystalline structure, and a dense close interface bonding exists between the film and the substrate. Auger electron spectroscopy depth profiling analysis of the film indicates that N and Ti penetrate into the substrate, resulting in a wide interfacial diffusion zone, which is about 150 nm. Microdiffraction patterns of the interface show that FeTi, Fe2Ti, and Ti2N phases exist in the interfacial diffusion zone. The results obtained indicate that the method of bombarding the him by N ions extends the film-substrate interfacial diffusion zone and stimulates the interfacial chemical reaction.
原文出处://WOS:A1996UR49700020
公开日期2012-04-14
源URL[http://ir.imr.ac.cn/handle/321006/38455]  
专题金属研究所_中国科学院金属研究所
推荐引用方式
GB/T 7714
Q. Q. Yang,L. H. Zhao,H. Q. Du,et al. The microstructure of Ti-B-N film-substrate interfaces[J]. Surface & Coatings Technology,1996,81(2-3):287-289.
APA Q. Q. Yang,L. H. Zhao,H. Q. Du,&L. S. Wen.(1996).The microstructure of Ti-B-N film-substrate interfaces.Surface & Coatings Technology,81(2-3),287-289.
MLA Q. Q. Yang,et al."The microstructure of Ti-B-N film-substrate interfaces".Surface & Coatings Technology 81.2-3(1996):287-289.

入库方式: OAI收割

来源:金属研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。