中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Reinvestigation of the first nucleated phase in Nb/Si multilayers

文献类型:期刊论文

作者M. Zhang ; W. Yu ; W. H. Wang ; W. K. Wang
刊名Thin Solid Films
出版日期1996
卷号289期号:1-2页码:180-183
关键词multilayers deposition process X-ray diffraction transmission electron microscopy (TEM) metal sequence systems growth si
ISSN号0040-6090
中文摘要The first nucleated phase in compositionally modulated Nb/Si multilayers was identified using transmission electron microscopy (TEM) and X-ray diffraction (XRD). A cubic Nb3Si phase was found to be formed when the Nb/Si multilayers were deposited at 200 degrees C and 300 degrees C. The formation of the crystalline silicide at such low temperatures is explained on the basis of theories of the effective heat of formation and classical nucleation.
原文出处://WOS:A1996WB26500032
公开日期2012-04-14
源URL[http://ir.imr.ac.cn/handle/321006/38481]  
专题金属研究所_中国科学院金属研究所
推荐引用方式
GB/T 7714
M. Zhang,W. Yu,W. H. Wang,et al. Reinvestigation of the first nucleated phase in Nb/Si multilayers[J]. Thin Solid Films,1996,289(1-2):180-183.
APA M. Zhang,W. Yu,W. H. Wang,&W. K. Wang.(1996).Reinvestigation of the first nucleated phase in Nb/Si multilayers.Thin Solid Films,289(1-2),180-183.
MLA M. Zhang,et al."Reinvestigation of the first nucleated phase in Nb/Si multilayers".Thin Solid Films 289.1-2(1996):180-183.

入库方式: OAI收割

来源:金属研究所

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