Reinvestigation of the first nucleated phase in Nb/Si multilayers
文献类型:期刊论文
作者 | M. Zhang ; W. Yu ; W. H. Wang ; W. K. Wang |
刊名 | Thin Solid Films
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出版日期 | 1996 |
卷号 | 289期号:1-2页码:180-183 |
关键词 | multilayers deposition process X-ray diffraction transmission electron microscopy (TEM) metal sequence systems growth si |
ISSN号 | 0040-6090 |
中文摘要 | The first nucleated phase in compositionally modulated Nb/Si multilayers was identified using transmission electron microscopy (TEM) and X-ray diffraction (XRD). A cubic Nb3Si phase was found to be formed when the Nb/Si multilayers were deposited at 200 degrees C and 300 degrees C. The formation of the crystalline silicide at such low temperatures is explained on the basis of theories of the effective heat of formation and classical nucleation. |
原文出处 | |
公开日期 | 2012-04-14 |
源URL | [http://ir.imr.ac.cn/handle/321006/38481] ![]() |
专题 | 金属研究所_中国科学院金属研究所 |
推荐引用方式 GB/T 7714 | M. Zhang,W. Yu,W. H. Wang,et al. Reinvestigation of the first nucleated phase in Nb/Si multilayers[J]. Thin Solid Films,1996,289(1-2):180-183. |
APA | M. Zhang,W. Yu,W. H. Wang,&W. K. Wang.(1996).Reinvestigation of the first nucleated phase in Nb/Si multilayers.Thin Solid Films,289(1-2),180-183. |
MLA | M. Zhang,et al."Reinvestigation of the first nucleated phase in Nb/Si multilayers".Thin Solid Films 289.1-2(1996):180-183. |
入库方式: OAI收割
来源:金属研究所
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