PHASE SELECTION IN INTERFACIAL REACTION OF NI/AMORPHOUS SI MULTILAYERS
文献类型：期刊论文
| 作者 | W. H. Wang ; H. Y. Bai ; Y. Zhang ; W. K. Wang |
| 刊名 | Journal of Applied Physics
 |
| 出版日期 | 1993 |
| 卷号 | 73期号:9页码:4313-4318 |
| 关键词 | silicide formation amorphous-silicon thin-films nucleation kinetics systems growth ni2si model |
| ISSN号 | 0021-8979 |
| 中文摘要 | The interfacial reaction in Ni and amorphous Si (a-Si) multilayers (Ni/a-Si) has been studied. Transmission electron microscope observation was used to monitor the progress of the solid-state reaction. It was found that amorphous Ni-silicide phase [a-(Ni,Si)] is the first phase formed in the Ni and a-Si interfacial reaction. A relatively large composition range for the amorphous phase exists in these Ni/a-Si multilayers. In the as-deposited Ni/a-Si multilayers with shorter modulation period, the uniform a-(Ni,Si) phase forms at least in the composition range of 25-62 at. % Ni. These results are consistent with predictions from the calculated Gibbs free-energy diagram. The delta-Ni2Si phase is the preferred phase in the crystallization process of a-(Ni,Si) even for the equiatomic Ni/a-Si multilayers. The mechanism that controls phase selection in the Ni/a-Si interfacial reaction is discussed using nucleation theory. A nucleation control model for phase selection is proposed. |
| 原文出处 | |
| 公开日期 | 2012-04-14 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/39140]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | W. H. Wang,H. Y. Bai,Y. Zhang,et al. PHASE SELECTION IN INTERFACIAL REACTION OF NI/AMORPHOUS SI MULTILAYERS[J]. Journal of Applied Physics,1993,73(9):4313-4318. |
| APA | W. H. Wang,H. Y. Bai,Y. Zhang,&W. K. Wang.(1993).PHASE SELECTION IN INTERFACIAL REACTION OF NI/AMORPHOUS SI MULTILAYERS.Journal of Applied Physics,73(9),4313-4318. |
| MLA | W. H. Wang,et al."PHASE SELECTION IN INTERFACIAL REACTION OF NI/AMORPHOUS SI MULTILAYERS".Journal of Applied Physics 73.9(1993):4313-4318. |
入库方式： OAI收割
来源：金属研究所
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