MICROSTRUCTURAL AND INDENTATION CHARACTERIZATION OF TI/TIN MULTILAYER FILMS
文献类型：期刊论文
| 作者 | R. F. Huang ; L. S. Wen ; L. P. Guo ; J. Gong ; B. H. Yu ; H. Bangert |
| 刊名 | Surface & Coatings Technology
 |
| 出版日期 | 1992 |
| 卷号 | 50期号:2页码:97-101 |
| ISSN号 | 0257-8972 |
| 中文摘要 | The microstructure of Ti/Tin multilayer films deposited by hollow cathode discharge ion plating, was studied using transmission electron microscopy and mu-mu-diffraction in combination with X-ray diffraction. The Ti/TiN multilayer films consisted of hexagonal alpha-Ti, tetragonal epsilon-Ti2N and cubic delta-TiN. They had a clearly layered structure of Ti/Ti2N/TiN/Ti2N/Ti..., with single layer thicknesses of titanium and TiN ranging from several to several hundred nanometers. Interfacial chemical reactions during deposition produced a Ti2N transition layer between every adjacent pair of titanium and TiN layers. A transition layer of FeTi between the film and the substrate was observed, which resulted in good adhesion between the film and the substrate. Ti/TiN multilayer films had fibrous crystallites. A refining of the grain size of multilayer films was discovered which could be correlated with the indentation behavior of the multilayer films. |
| 原文出处 | |
| 公开日期 | 2012-04-14 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/39231]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | R. F. Huang,L. S. Wen,L. P. Guo,et al. MICROSTRUCTURAL AND INDENTATION CHARACTERIZATION OF TI/TIN MULTILAYER FILMS[J]. Surface & Coatings Technology,1992,50(2):97-101. |
| APA | R. F. Huang,L. S. Wen,L. P. Guo,J. Gong,B. H. Yu,&H. Bangert.(1992).MICROSTRUCTURAL AND INDENTATION CHARACTERIZATION OF TI/TIN MULTILAYER FILMS.Surface & Coatings Technology,50(2),97-101. |
| MLA | R. F. Huang,et al."MICROSTRUCTURAL AND INDENTATION CHARACTERIZATION OF TI/TIN MULTILAYER FILMS".Surface & Coatings Technology 50.2(1992):97-101. |
入库方式： OAI收割
来源：金属研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。