FRACTON-ELECTRON INTERACTION - A POSSIBLE ORIGIN OF THE RESISTIVITY MINIMA AT LOW-TEMPERATURES IN METALLIC GLASSES
文献类型：期刊论文
| 作者 | D. C. Tian ; J. X. Li ; Z. H. Zhang |
| 刊名 | Physical Review B
 |
| 出版日期 | 1992 |
| 卷号 | 45期号:14页码:8116-8119 |
| 关键词 | disordered-systems thermal-conductivity percolation clusters amorphous materials nonradiative decay alloys resistance relaxation states |
| ISSN号 | 0163-1829 |
| 中文摘要 | We calculate the temperature dependence of resistivity to second order of the interaction between the conduction electrons (extended) and fractons (excitations in a fractal lattice). The result shows that the resistivity rho varies as [1n(HBAr-omega(F)/kT-HBAR-omega(c))]2 (omega(F) the fraction Debye frequency and omega(c) the phonon-fraction crossover frequency). It is demonstrated that resistivity minima at low temperatures in weak-scattering metallic glasses might be due to a competition between negative temperature coefficients of resistivity (TCR's) resulting from the electron-fracton interaction and a positive TCR from the regular electron-phonon interaction. |
| 原文出处 | |
| 公开日期 | 2012-04-14 |
| 源URL | [http://ir.imr.ac.cn/handle/321006/39296]  |
| 专题 | 金属研究所_中国科学院金属研究所 |
| 推荐引用方式 GB/T 7714 | D. C. Tian,J. X. Li,Z. H. Zhang. FRACTON-ELECTRON INTERACTION - A POSSIBLE ORIGIN OF THE RESISTIVITY MINIMA AT LOW-TEMPERATURES IN METALLIC GLASSES[J]. Physical Review B,1992,45(14):8116-8119. |
| APA | D. C. Tian,J. X. Li,&Z. H. Zhang.(1992).FRACTON-ELECTRON INTERACTION - A POSSIBLE ORIGIN OF THE RESISTIVITY MINIMA AT LOW-TEMPERATURES IN METALLIC GLASSES.Physical Review B,45(14),8116-8119. |
| MLA | D. C. Tian,et al."FRACTON-ELECTRON INTERACTION - A POSSIBLE ORIGIN OF THE RESISTIVITY MINIMA AT LOW-TEMPERATURES IN METALLIC GLASSES".Physical Review B 45.14(1992):8116-8119. |
入库方式： OAI收割
来源：金属研究所
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