中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
DEEP LEVELS IN GAMMA-RAY IRRADIATED N-TYPE AND P-TYPE HYDROGEN-GROWN FLOAT-ZONED SILICON

文献类型:期刊论文

作者M. H. Yuan ; D. C. Peng ; Q. Z. Peng ; Y. H. Zhang ; J. Q. Li ; G. G. Qin
刊名Journal of Applied Physics
出版日期1992
卷号71期号:3页码:1182-1188
关键词crystalline semiconductors defects
ISSN号0021-8979
中文摘要The generation rates and annealing behavior of the irradiation defects in n- and p-type hydrogen-grown float-zoned silicon (irradiated with gamma-rays from Co-60) have been studied by the deep-level transient spectroscopy technique and compared with those of irradiated argon-grown float-zoned silicon. Assuming the generation rate of the irradiation defects created by gamma-rays in argon-grown float-zoned silicon is 1, then the generation rates of the A center, divacancy, and phosphorus vacancy in n-type hydrogen-grown float-zoned silicon are 0.23, 0.78, and 0.19, respectively, while the generation rates of the divacancy and H(0.37 eV) in p-type hydrogen-grown silicon are 0.79 and 0.10, respectively. Due to the existence of hydrogen, the generation rate reduction of the major irradiation defects in gamma-ray irradiated silicon is more pronounced than that in 1-MeV electron irradiated silicon. Three hydrogen-related defects, H(0.10 eV), H(0.29 eV), and H(0.56 eV), were seen in gamma-ray irradiated hydrogen-grown float-zoned silicon, among which H(0.10 eV) and H(0.56 eV) were reported by us to exist in electron irradiated hydrogen-grown float-zoned silicon, while H(0.29 eV) is reported for the first time. The convergence effect of annealing temperatures for the irradiation defects was observed. That is, the annealing temperatures at which the irradiation defects diminish are almost the same for most irradiation defects, similar to that in the case of electron irradiation, was observed, showing that this effect is characteristic of the hydrogen behavior in silicon, and irrelevant to the type of irradiation.
原文出处://WOS:A1992HC90800015
公开日期2012-04-14
源URL[http://ir.imr.ac.cn/handle/321006/39342]  
专题金属研究所_中国科学院金属研究所
推荐引用方式
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M. H. Yuan,D. C. Peng,Q. Z. Peng,et al. DEEP LEVELS IN GAMMA-RAY IRRADIATED N-TYPE AND P-TYPE HYDROGEN-GROWN FLOAT-ZONED SILICON[J]. Journal of Applied Physics,1992,71(3):1182-1188.
APA M. H. Yuan,D. C. Peng,Q. Z. Peng,Y. H. Zhang,J. Q. Li,&G. G. Qin.(1992).DEEP LEVELS IN GAMMA-RAY IRRADIATED N-TYPE AND P-TYPE HYDROGEN-GROWN FLOAT-ZONED SILICON.Journal of Applied Physics,71(3),1182-1188.
MLA M. H. Yuan,et al."DEEP LEVELS IN GAMMA-RAY IRRADIATED N-TYPE AND P-TYPE HYDROGEN-GROWN FLOAT-ZONED SILICON".Journal of Applied Physics 71.3(1992):1182-1188.

入库方式: OAI收割

来源:金属研究所

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