Effect of gas pressure on the properties of silicon thin film
文献类型：期刊论文
| 作者 | Hao, Hui-Ying ; Li, Wei-Min ; Zeng, Xiang-Bo ; Kong, Guang-Lin ; Liao, Xian-Bo |
| 刊名 | gongneng cailiao/journal of functional materials
 |
| 出版日期 | 2011 |
| 卷号 | 42期号:8页码:1489-1491 |
| ISSN号 | 10019731 |
| 关键词 | Amorphous films Chemical vapor deposition Deposition Microcrystalline silicon Microstructure Photoelectricity Plasma deposition Plasma enhanced chemical vapor deposition Pressure effects Semiconducting silicon compounds Transport properties |
| 通讯作者 | hao, h.-y. |
| 学科主题 | 半导体材料 |
| 收录类别 | EI |
| 语种 | 中文 |
| 公开日期 | 2012-06-14 |
| 源URL | [http://ir.semi.ac.cn/handle/172111/23121]  |
| 专题 | 半导体研究所_中科院半导体材料科学重点实验室 |
| 推荐引用方式 GB/T 7714 | Hao, Hui-Ying,Li, Wei-Min,Zeng, Xiang-Bo,et al. Effect of gas pressure on the properties of silicon thin film[J]. gongneng cailiao/journal of functional materials,2011,42(8):1489-1491. |
| APA | Hao, Hui-Ying,Li, Wei-Min,Zeng, Xiang-Bo,Kong, Guang-Lin,&Liao, Xian-Bo.(2011).Effect of gas pressure on the properties of silicon thin film.gongneng cailiao/journal of functional materials,42(8),1489-1491. |
| MLA | Hao, Hui-Ying,et al."Effect of gas pressure on the properties of silicon thin film".gongneng cailiao/journal of functional materials 42.8(2011):1489-1491. |
入库方式： OAI收割
来源：半导体研究所
浏览0
下载0
收藏0
其他版本
除非特别说明，本系统中所有内容都受版权保护，并保留所有权利。