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A magnetron sputtering technique to prepare a-C:H films: Effect of substrate bias

文献类型：期刊论文

作者Zhou HD(周惠娣); Ye YP(冶银平); Ji L(吉利); Chen JM(陈建敏); Li HX(李红轩)
刊名Applied Surface Science
出版日期2011
卷号257页码:1990-1995
关键词a-C:H film Magnetron sputtering Substrate bias Microstructure Tribological property
ISSN号0169-4332
通讯作者冶银平
中文摘要Amorphous hydrogenated carbon (a-C:H) films were deposited bymagnetron sputtering with amixture gas of Ar and CH4. The a-C:H films deposited by this method have relatively low internal stress (<1GPa) compared to some films deposited by conventional deposition process. The effects of substrate bias voltage onmicrostructure, surfacemorphology andmechanical properties of the filmswere investigated by various techniques. It has been found that the polymer-like structure is dominated at lowbias voltage (−100V), while the diamond-like structure with the highest hardness and internal stress is the main feature of the a-C:H films deposited under high bias voltage (−300V). With increasing the bias voltage further, the feature of diamond-like structure decreases associating with the increase of graphitization. The frictional test shows that the friction coefficient and wear rate of the a-C:H films are depended strongly on structure and mechanical properties, which were ultimately influenced by the deposition method and bias voltage.
学科主题材料科学与物理化学
收录类别SCI
资助信息the National Natural Science Foundation of China (Grant NO.50705093);the Innovative Group Foundation from NSFC (Grant NO.50421502)
语种英语
公开日期2012-09-24
源URL[http://210.77.64.217/handle/362003/685]  
专题兰州化学物理研究所_固体润滑国家重点实验室
兰州化学物理研究所_先进润滑与防护材料研究发展中心
通讯作者Ye YP(冶银平)
推荐引用方式
GB/T 7714		 Zhou HD,Ye YP,Ji L,et al. A magnetron sputtering technique to prepare a-C:H films: Effect of substrate bias[J]. Applied Surface Science,2011,257:1990-1995.
APA 周惠娣,冶银平,吉利,陈建敏,&李红轩.(2011).A magnetron sputtering technique to prepare a-C:H films: Effect of substrate bias.Applied Surface Science,257,1990-1995.
MLA 周惠娣,et al."A magnetron sputtering technique to prepare a-C:H films: Effect of substrate bias".Applied Surface Science 257(2011):1990-1995.

入库方式： OAI收割

来源：兰州化学物理研究所

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