Molecular dynamics simulation of zero-fluence and low-bombarding-energy Cu-63-Cu-65 sputtering
文献类型：期刊论文
| 作者 | Zheng, LP（郑里平） ; Qiu, S ; Zu, YK ; Li, RS |
| 刊名 | JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY
 |
| 出版日期 | 1999 |
| 卷号 | 15期号:2页码:184 |
| ISSN号 | 1005-0302 |
| 英文摘要 | A molecular dynamics simulation has been used to study zero-fluence and low- bombarding-energy Cu-63-Cu-65 sputtering. Calculations show that the isotopic ratios at both theta less than or equal to 35 degrees and theta >35 degrees, and the total isotopic ratio increase when the bombarding energy decreases. This result might imply the existence of the bombarding-energy-dependent momentum asymmetry. |
| 收录类别 | SCI |
| WOS记录号 | WOS:000079552000017 |
| 公开日期 | 2012-09-25 |
| 源URL | [http://ir.sinap.ac.cn/handle/331007/10064]  |
| 专题 | 上海应用物理研究所_中科院上海原子核所2003年前 |
| 推荐引用方式 GB/T 7714 | Zheng, LP,Qiu, S,Zu, YK,et al. Molecular dynamics simulation of zero-fluence and low-bombarding-energy Cu-63-Cu-65 sputtering[J]. JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,1999,15(2):184. |
| APA | Zheng, LP,Qiu, S,Zu, YK,&Li, RS.(1999).Molecular dynamics simulation of zero-fluence and low-bombarding-energy Cu-63-Cu-65 sputtering.JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY,15(2),184. |
| MLA | Zheng, LP,et al."Molecular dynamics simulation of zero-fluence and low-bombarding-energy Cu-63-Cu-65 sputtering".JOURNAL OF MATERIALS SCIENCE & TECHNOLOGY 15.2(1999):184. |
入库方式： OAI收割
来源：上海应用物理研究所
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