中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
Study of the ion implantation of Sn-119 in a-Si1-xCx : H

文献类型:期刊论文

作者Barancira, T ; Moons, R ; Koops, GEJ ; Deweerd, W ; Pattyn, H ; Tzenov, N ; Tzolov, M ; Dimova-Malinovska, D ; Tsvetkova, T ; Venegas, R ; Zhang, GL(张桂林)
刊名JOURNAL OF NON-CRYSTALLINE SOLIDS
出版日期1999
卷号244期号:40942页码:189
ISSN号0022-3093
英文摘要The Mossbauer spectroscopy and Rutherford backscattering spectroscopy studies presented here allow an investigation of the origins of the previously observed changes in optical absorption in sputter deposited a-Si1-xCx:H films caused by high dose Sn implantations. To this end, we investigate the microscopic surroundings and the bonding structures of the Sn atoms. At doses up to 1 x 10(17) cm(-2) a major fraction of Sn takes a quasi-substitutional site, sp(3) bonded to four Si neighbours, while a smaller fraction is present as Sn2+, presumably due to SnO formation. The latter fraction increases at the higher doses and the increase is paralleled by the formation of Sn4+ and a prominent metallic sn component. This beta-Sn fraction, presumably in the form of nanosized precipitates, becomes dominant at the higher doses, thus explaining the complete lack of optical transmission. (C) 1999 Elsevier Science B.V. All rights reserved.
收录类别SCI
语种英语
WOS记录号WOS:000079509900010
公开日期2012-09-25
源URL[http://ir.sinap.ac.cn/handle/331007/10189]  
专题上海应用物理研究所_中科院上海原子核所2003年前
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GB/T 7714
Barancira, T,Moons, R,Koops, GEJ,et al. Study of the ion implantation of Sn-119 in a-Si1-xCx : H[J]. JOURNAL OF NON-CRYSTALLINE SOLIDS,1999,244(40942):189.
APA Barancira, T.,Moons, R.,Koops, GEJ.,Deweerd, W.,Pattyn, H.,...&Zhang, GL.(1999).Study of the ion implantation of Sn-119 in a-Si1-xCx : H.JOURNAL OF NON-CRYSTALLINE SOLIDS,244(40942),189.
MLA Barancira, T,et al."Study of the ion implantation of Sn-119 in a-Si1-xCx : H".JOURNAL OF NON-CRYSTALLINE SOLIDS 244.40942(1999):189.

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来源:上海应用物理研究所

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