GaAs surface wet cleaning by a novel treatment in revolving ultrasonic atomization solution
文献类型：期刊论文
| 作者 | Zaijin L. ; Liming H. ; Ye W. ; Ye Y. ; Hangyu P. ; Jinlong Z. ; Li Q. ; Yun L. ; Lijun W. |
| 刊名 | Journal of Semiconductors
 |
| 出版日期 | 2010 |
| 卷号 | 31期号:3 |
| ISSN号 | 16744926 |
| 其他题名 | 论文其他题名 |
| 收录类别 | EI |
| 公开日期 | 2012-10-21 |
| 源URL | [http://ir.ciomp.ac.cn/handle/181722/24461]  |
| 专题 | 长春光学精密机械与物理研究所_中科院长春光机所知识产出 |
| 推荐引用方式 GB/T 7714 | Zaijin L.,Liming H.,Ye W.,et al. GaAs surface wet cleaning by a novel treatment in revolving ultrasonic atomization solution[J]. Journal of Semiconductors,2010,31(3). |
| APA | Zaijin L..,Liming H..,Ye W..,Ye Y..,Hangyu P..,...&Lijun W..(2010).GaAs surface wet cleaning by a novel treatment in revolving ultrasonic atomization solution.Journal of Semiconductors,31(3). |
| MLA | Zaijin L.,et al."GaAs surface wet cleaning by a novel treatment in revolving ultrasonic atomization solution".Journal of Semiconductors 31.3(2010). |
入库方式： OAI收割
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