Fabrication of blazed gratings used in ultraviolet region by holographic ion beam etching based on photoresist melting
文献类型：期刊论文
| 作者 | Qi X.D.
|
| 刊名 | Optoelectronics Letters
 |
| 出版日期 | 2008 |
| 卷号 | 4期号:3页码:177-179 |
| ISSN号 | 16731905 |
| 其他题名 | 论文其他题名 |
| 收录类别 | EI |
| 公开日期 | 2012-10-21 |
| 源URL | [http://ir.ciomp.ac.cn/handle/181722/24494]  |
| 专题 | 长春光学精密机械与物理研究所_中科院长春光机所知识产出 |
| 推荐引用方式 GB/T 7714 | Qi X.D.. Fabrication of blazed gratings used in ultraviolet region by holographic ion beam etching based on photoresist melting[J]. Optoelectronics Letters,2008,4(3):177-179. |
| APA | Qi X.D..(2008).Fabrication of blazed gratings used in ultraviolet region by holographic ion beam etching based on photoresist melting.Optoelectronics Letters,4(3),177-179. |
| MLA | Qi X.D.."Fabrication of blazed gratings used in ultraviolet region by holographic ion beam etching based on photoresist melting".Optoelectronics Letters 4.3(2008):177-179. |
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