The induction plasma chemical reactor: Part I. Equilibrium model
文献类型：期刊论文
| 作者 | Zhao GY; Mostaghimi J; Boulos MI |
| 刊名 | Plasma Chemistry and Plasma Processing
 |
| 出版日期 | 1990 |
| 卷号 | 10期号:1页码:133-150 |
| 关键词 | Induction plasma - modeling - chemical equilibrium - silicon nitride synthesis |
| ISSN号 | 0272-4324 |
| 中文摘要 | A mathematical model is presented for the numerical simulation of the flow, temperature, and concentration fields in an rf plasma chemical reactor. The simulation is performed assuming chemical equilibrium. The extent of validity of this assumption is discussed. The system considered is the reaction of SiCl4 and NH3 for the production of Si3N4. |
| 类目[WOS] | Engineering, Chemical ; Physics, Applied ; Physics, Fluids & Plasmas |
| 研究领域[WOS] | Engineering ; Physics |
| 收录类别 | SCI |
| 语种 | 英语 |
| WOS记录号 | WOS:A1990CT88500008 |
| 公开日期 | 2009-08-03 ; 2010-08-20 |
| 源URL | [http://dspace.imech.ac.cn/handle/311007/39594]  |
| 专题 | 力学研究所_力学所知识产出(1956-2008) |
| 推荐引用方式 GB/T 7714 | Zhao GY,Mostaghimi J,Boulos MI. The induction plasma chemical reactor: Part I. Equilibrium model[J]. Plasma Chemistry and Plasma Processing,1990,10(1):133-150. |
| APA | Zhao GY,Mostaghimi J,&Boulos MI.(1990).The induction plasma chemical reactor: Part I. Equilibrium model.Plasma Chemistry and Plasma Processing,10(1),133-150. |
| MLA | Zhao GY,et al."The induction plasma chemical reactor: Part I. Equilibrium model".Plasma Chemistry and Plasma Processing 10.1(1990):133-150. |
入库方式： OAI收割
来源：力学研究所
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