中国科学院机构知识库网格
Chinese Academy of Sciences Institutional Repositories Grid
The induction plasma chemical reactor: Part I. Equilibrium model

文献类型:期刊论文

作者Zhao GY; Mostaghimi J; Boulos MI
刊名Plasma Chemistry and Plasma Processing
出版日期1990
卷号10期号:1页码:133-150
关键词Induction plasma - modeling - chemical equilibrium - silicon nitride synthesis
ISSN号0272-4324
中文摘要A mathematical model is presented for the numerical simulation of the flow, temperature, and concentration fields in an rf plasma chemical reactor. The simulation is performed assuming chemical equilibrium. The extent of validity of this assumption is discussed. The system considered is the reaction of SiCl4 and NH3 for the production of Si3N4.
类目[WOS]Engineering, Chemical ; Physics, Applied ; Physics, Fluids & Plasmas
研究领域[WOS]Engineering ; Physics
收录类别SCI
语种英语
WOS记录号WOS:A1990CT88500008
公开日期2009-08-03 ; 2010-08-20
源URL[http://dspace.imech.ac.cn/handle/311007/39594]  
专题力学研究所_力学所知识产出(1956-2008)
推荐引用方式
GB/T 7714
Zhao GY,Mostaghimi J,Boulos MI. The induction plasma chemical reactor: Part I. Equilibrium model[J]. Plasma Chemistry and Plasma Processing,1990,10(1):133-150.
APA Zhao GY,Mostaghimi J,&Boulos MI.(1990).The induction plasma chemical reactor: Part I. Equilibrium model.Plasma Chemistry and Plasma Processing,10(1),133-150.
MLA Zhao GY,et al."The induction plasma chemical reactor: Part I. Equilibrium model".Plasma Chemistry and Plasma Processing 10.1(1990):133-150.

入库方式: OAI收割

来源:力学研究所

浏览0
下载0
收藏0
其他版本

除非特别说明,本系统中所有内容都受版权保护,并保留所有权利。