Influence of substrate bias voltage on the microstructure and residual stress of CrN films deposited by medium frequency magnetron sputtering
文献类型：期刊论文
| 作者 | Ji L(吉利) ; Li HX(李红轩); Li HX(李红轩); Zhou HD(周惠娣); Chen JM(陈建敏); Liu XH(刘晓红)
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| 刊名 | Materials Science and Engineering B
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| 出版日期 | 2011 |
| 卷号 | 176页码:850-854 |
| 关键词 | CrN films Medium frequency magnetron sputterin Substrate bias voltage Microstructure Residual stress |
| ISSN号 | 0921-5107 |
| 通讯作者 | 李红轩 |
| 中文摘要 | In this study, CrN films were deposited on stainless steel and Si (1 1 1) substrates via medium frequency magnetron sputtering under a systematic variation of the substrate bias voltage. The influence of the substrate bias voltage on the structural and the mechanical properties of the films were investigated. It is observed that there are two clear regions(1) below −300V, and (2) above −300V. For the former region, the (1 1 1) texture is dominated as the substrate bias voltage is increased to −200V. The lattice parameter is smaller than that of CrN reported in the ICSD standard (4.140 ˚ A) and the as-deposited films exhibit tensile stress. Meanwhile, the surface roughness decreases and the N concentration show a slow increase. For the latter region, the (2 0 0)-oriented structure is formed. However, the lattice parameter is larger as compared with the value reported in the ICSD standard, and the surface roughness increases and the N concentration decreases obviously. In this case, the compressive stress is obtained. |
| 学科主题 | 材料科学与物理化学 |
| 收录类别 | SCI |
| 资助信息 | the National Natural Science Foundation of China (Grant NO.50705093);the Innovative Group Foundation from NSFC (Grant NO.50421502) |
| 语种 | 英语 |
| 公开日期 | 2012-09-24 |
| 源URL | [http://210.77.64.217/handle/362003/788]  |
| 专题 | 兰州化学物理研究所_固体润滑国家重点实验室 兰州化学物理研究所_先进润滑与防护材料研究发展中心 |
| 通讯作者 | Li HX(李红轩); Li HX(李红轩) |
| 推荐引用方式 GB/T 7714 | Ji L,Li HX,Li HX,et al. Influence of substrate bias voltage on the microstructure and residual stress of CrN films deposited by medium frequency magnetron sputtering[J]. Materials Science and Engineering B,2011,176:850-854. |
| APA | 吉利,李红轩,李红轩,周惠娣,陈建敏,&刘晓红.(2011).Influence of substrate bias voltage on the microstructure and residual stress of CrN films deposited by medium frequency magnetron sputtering.Materials Science and Engineering B,176,850-854. |
| MLA | 吉利,et al."Influence of substrate bias voltage on the microstructure and residual stress of CrN films deposited by medium frequency magnetron sputtering".Materials Science and Engineering B 176(2011):850-854. |
入库方式： OAI收割
来源：兰州化学物理研究所
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