Structure and characteristics of amorphous (Ti,Si)–C:H films deposited by reactive magnetron sputtering
文献类型：期刊论文
| 作者 | Wang P(王鹏) ; Hao JY(郝俊英); Liu WM(刘维民)
|
| 刊名 | Diamond and Related Materials
 |
| 出版日期 | 2010 |
| 卷号 | 19页码:1172-1177 |
| 关键词 | Amorphous hydrogenated carbon Doping Microstructure Superlow friction |
| ISSN号 | 0925-9635 |
| 通讯作者 | 刘维民 |
| 中文摘要 | The hydrogenated amorphous carbon films doped with Ti and Si ((Ti,Si)–C:H) were deposited on siliconsubstrates using reactive magnetron sputtering Ti80Si20 composite target in an argon and methane gasmixture. The structures of the films were analyzed by X-ray photoelectron spectroscopy and Visible Ramanspectroscopy. The morphologies were observed by atomic force microscope. The friction coefficients of thefilms were tested on the ball-on-disc tribometer. The results indicate that the sp3/sp2ratios in the films canbe varied from 0.18 to 0.63 by changing Ti and Si contents at various CH4 flow rates. The surface of the filmsbecomes smoother and more compact as the CH4 flow rate increases. The lowest friction coefficient is as lowas 0.0139 for the film with Ti of 4.5 at.% and Si of 1.0 at.%. Especially, the film exhibits a superlow value(μb0.01) under ambient air with 40% relative humidity in friction process. The superlow friction coefficientin ambient air may be, attributable to synergistic effects of a combination of Ti and Si in the film. |
| 学科主题 | 材料科学与物理化学 |
| 收录类别 | SCI |
| 资助信息 | the Natural Science Foundation of China (Grant No: 50823008,50905177, 50902133);973 Project (Grant; No. 2007CB607601) of the Ministry of Science and Technology of China. |
| 语种 | 英语 |
| 公开日期 | 2012-09-28 |
| 源URL | [http://210.77.64.217/handle/362003/985]  |
| 专题 | 兰州化学物理研究所_固体润滑国家重点实验室 |
| 通讯作者 | Liu WM(刘维民) |
| 推荐引用方式 GB/T 7714 | Wang P,Hao JY,Liu WM. Structure and characteristics of amorphous (Ti,Si)–C:H films deposited by reactive magnetron sputtering[J]. Diamond and Related Materials,2010,19:1172-1177. |
| APA | 王鹏,郝俊英,&刘维民.(2010).Structure and characteristics of amorphous (Ti,Si)–C:H films deposited by reactive magnetron sputtering.Diamond and Related Materials,19,1172-1177. |
| MLA | 王鹏,et al."Structure and characteristics of amorphous (Ti,Si)–C:H films deposited by reactive magnetron sputtering".Diamond and Related Materials 19(2010):1172-1177. |
入库方式： OAI收割
来源：兰州化学物理研究所
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